Secondary grain growth in thin films of semiconductors: Theoretical aspects

Secondary grain growth in thin films can lead to grain sizes much greater than the film thickness. Surface energy anisotropy often provides an important fraction of the driving force for secondary grain growth, especially in the early stages of growth. Surface‐energy‐driven secondary grain growth leads to the development of large grains with restricted crystallographic textures. A model is presented for growth of secondary grains into a uniform matrix of columnar normal grains. The model indicates that secondary grain growth rates should increase with grain boundary energy, surface energy anisotropy, grain boundary mobility, and temperature. While final secondary grain sizes will decrease with film thickness, their growth rates will increase. The final secondary grain sizes and orientations will be strongly affected by grain sizes and orientations in the initial film. The models presented here provide analytical tools for experimental study of secondary grain growth in thin films. They will be used in for...

[1]  E. Gilbert Random Subdivisions of Space into Crystals , 1962 .

[2]  R. J. Jaccodine,et al.  Surface Energy of Germanium and Silicon , 1963 .

[3]  M. Mclean,et al.  Surface energy and the secondary recrystallisation of platinum sheet , 1965 .

[4]  F. d'Heurle,et al.  Anomalous large grains in alloyed aluminum thin films I. Secondary grain growth in aluminum-copper films , 1972 .

[5]  H. Heijligers,et al.  Recrystallization processes in polycrystalline silicon , 1975 .

[6]  Yasuo Wada,et al.  Grain Growth Mechanism of Heavily Phosphorus‐Implanted Polycrystalline Silicon , 1978 .

[7]  G. C. Jain,et al.  Grain growth in polycrystalline silicon , 1978 .

[8]  J. Bezemer,et al.  Recrystallization of Polycrystalline CVD Grown Silicon , 1980 .

[9]  Michael F. Ashby,et al.  Correlations for diffusion constants , 1980 .

[10]  R. Dutton,et al.  Grain‐Growth Mechanisms in Polysilicon , 1982 .

[11]  David Turnbull,et al.  Heat of crystallization and melting point of amorphous silicon , 1983 .

[12]  S. Kalbitzer,et al.  Study of Si self-diffusion by nuclear techniques , 1983 .

[13]  M. Severi,et al.  Effect of impurities on the grain growth of chemical vapor deposited polycrystalline silicon films , 1983 .

[14]  D. Weaire,et al.  Soap, cells and statistics – random patterns in two dimensions , 1984 .

[15]  Henry I. Smith,et al.  Graphoepitaxy of Ge on SiO2 by solid‐state surface‐energy‐driven grain growth , 1984 .

[16]  Henry I. Smith,et al.  Surface‐energy‐driven secondary grain growth in ultrathin (<100 nm) films of silicon , 1984 .