论文信息 - Molecular carbon implant technology for ultra-shallow junction formation and n-MOSFET strain application in a 40nm node logic device - 字舞流文

Molecular carbon implant technology for ultra-shallow junction formation and n-MOSFET strain application in a 40nm node logic device

M. Ameen | D. Tieger | J. Shiu | L. Rubin | Ching-I Li | P. Kuo | Po Wei Liu | H. Lai | R. Liu | M. Chan | C.N. Yang | J.Y. Wu | B. Chang | E. Tien | Po Wei Liu