3 – MICROLITHOGRAPHY METROLOGY
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[1] O. Yamada,et al. Hitachi S-6000 Field Emission CD-Measurement SEM , 1986, Optics & Photonics.
[2] Some experimental measurements of diffraction images in low-resolution microscopy , 1963 .
[3] W. R. Thurber,et al. Bridge and van der Pauw Sheet Resistors for Characterizing the Line Width of Conducting Layers , 1978 .
[4] W. R. Thurber,et al. An Experimental Study of Various Cross Sheet Resistor Test Structures , 1978 .
[5] D. Nyyssonen. Linewidth measurement with an optical microscope: the effect of operating conditions on the image profile. , 1977, Applied optics.
[6] David C. Joy,et al. A model for calculating secondary and backscattered electron yields , 1987 .
[7] C. P. Kirk,et al. Aberration effects in an optical measuring microscope. , 1987, Applied optics.
[8] R. Kinzly. Investigations of the Influence of the Degree of Coherence upon Images of Edge Objects , 1965 .
[9] N. Samoto,et al. Changes of Volume and Surface Compositions of Polymethylmethacrylate under Electron Beam Irradiation in Lithography , 1985 .
[10] Richard E. Swing. The Theoretical Basis Of A New Optical Method For The Accurate Measurement Of Small Line-Widths , 1976, Other Conferences.
[11] L. W. Linholm,et al. An Electrical Test Structure for Proximity Effects Measurement and Correction , 1985 .
[12] S. Namba,et al. Direct Writing of Gratings by Electron Beam in Poly(metyl methacrylate) Optical Waveguides , 1979 .
[13] T. Everhart,et al. Wide-band detector for micro-microampere low-energy electron currents , 1960 .
[14] O. Wells. Low‐Loss Image for Surface Scanning Electron Microscope , 1971 .
[15] J. F. Mancuso,et al. Microchannel plate detector for low voltage scanning electron microscopes , 1985 .
[16] S. Erasmus. Damage to resist structures during scanning electron microscope inspection , 1987 .
[17] T. Matsukawa,et al. A New Type Edge Effect in High Resolution Scanning Electron Microscopy , 1974 .
[18] Donald J. Evins,et al. Computer Controlled E-Beam CC-CD System , 1986, Optics & Photonics.
[19] Manfred von Ardenne,et al. Das Elektronen-Rastermikroskop , 1938 .
[20] O. Wells. Effects of collector take-off angle and energy filtering on the BSE image in the SEM , 1979 .
[21] Dennis A. Swyt. An NBS Physical Standard For The Calibration Of Photomask Linewidth Measuring Systems , 1978, Other Conferences.
[22] L. Reimer,et al. Detector system for backscattered electrons by conversion to secondary electrons , 1979 .
[23] S. Okayama,et al. Penetration and energy-loss theory of electrons in solid targets , 1972 .
[24] M. Buehler,et al. The split-cross-bridge resistor for measuring the sheet resistance, linewidth, and line spacing of conducting layers , 1986, IEEE Transactions on Electron Devices.
[25] L. W. Linholm,et al. A Cross‐Bridge Test Structure for Evaluating the Linewidth Uniformity of an Integrated Circuit Lithography System , 1982 .
[26] Robert D. Larrabee,et al. Submicrometer Optical Linewidth Metrology , 1987, Advanced Lithography.
[27] K. C. A. Smith,et al. On‐line digital computer techniques in electron microscopy: general introduction , 1982 .
[28] Rod Norville. SCANLINE - A Dedicated Fab Line SEM LW Measurement System , 1986, Optics & Photonics.
[29] Kevin M. Monahan,et al. Nanometer-resolution SEM Metrology in a Hostile Laboratory Environment , 1986, Optics & Photonics.
[30] M. Postek,et al. The relationship between accelerating voltage and electron detection modes to linewidth measurement in an SEM , 1988 .
[31] Martin G. Buehler,et al. A numerical analysis of various cross sheet resistor test structures , 1977 .
[32] D. Nyyssonen,et al. Submicrometer Linewidth Metrology In the Optical Microscope , 1987, Journal of Research of the National Bureau of Standards.
[33] P. Rez. A transport equation theory of beam spreading in the electron microscope , 1983 .
[34] Diana Nyyssonen,et al. Modeling The Optical Microscope Images Of Thick Layers For The Purpose Of Linewidth Measurement , 1985, Advanced Lithography.
[35] S. Erasmus. Reduction of noise in TV rate electron microscope images by digital filtering , 1982 .
[36] O. Wells. Low‐loss electron images of uncoated photoresist in the scanning electron microscope , 1986 .
[37] Chris P. Kirk. A Study Of The Instrumental Errors In Linewidth And Registration Measurements Made With An Optical Microscope. , 1987, Advanced Lithography.
[38] L. Reimer,et al. The shrinkage of bulk polymers by radiation damage in an SEM , 1985 .
[39] T. Someya,et al. Development Of Sem-Based Dedicated Ic Metrology System , 1984, Other Conferences.
[40] M. Brunner,et al. Design and Application of a Quadrupole Detector for Low-Voltage Scanning Electron Microscopy , 1986 .
[41] Michael T. Postek,et al. Submicrometer Microelectronics Dimensional Metrology: Scanning Electron Microscopy , 1987, Journal of Research of the National Bureau of Standards.
[42] D. Nyyssonen,et al. SEM-based System For Calibration Of Linewidth SRMs For The IC industry , 1986, Optics & Photonics.
[43] D. Nyyssonen,et al. Spatial Coherence: The Key To Accurate Optical Micrometrology , 1979, Optics & Photonics.
[44] K. C. A. Smith,et al. An automatic focusing and astigmatism correction system for the SEM and CTEM , 1982 .
[45] B M Watrasiewicz,et al. Image formation in microscopy at high numerical aperture. , 1965, Optica acta.
[46] W. Charman. Diffraction Images of Circular Objects in High-Resolution Microscopy , 1963 .