Systematic investigation of the synthesis, characterization and switching mechanism of metal oxide nanoparticle resists

Metal oxide nanoparticle resists have recently emerged as next generation photoresist materials which exhibit promising performance for extreme ultraviolet lithography. In this present work, we are able to show our ability to synthesize and well characterize small uniform metal oxide nanoparticles, to present stability study of the nanoparticles in the resist solvent over time, to pattern ~20 nm features by electron beam lithography, and to provide an insight into the insolubilization mechanism of the resist system.

[1]  Markos Trikeriotis,et al.  Development of an inorganic photoresist for DUV, EUV, and electron beam imaging , 2010, Advanced Lithography.

[2]  Marco Litschauer,et al.  Photoluminescence as Complementary Evidence for Short-Range Order in Ionic Silica Nanoparticle Networks , 2010, The journal of physical chemistry. C, Nanomaterials and interfaces.

[3]  Jing Jiang,et al.  Solubility studies of inorganic-organic hybrid nanoparticle photoresists with different surface functional groups. , 2016, Nanoscale.

[4]  Markos Trikeriotis,et al.  Nanoparticle photoresists from HfO2 and ZrO2 for EUV patterning , 2012 .

[5]  R. Silverstein,et al.  Spectrometric identification of organic compounds , 2013 .

[6]  Markos Trikeriotis,et al.  High refractive index and high transparency HfO2 nanocomposites for next generation lithography , 2010 .

[7]  Christopher K. Ober,et al.  Increasing sensitivity of oxide nanoparticle photoresists , 2014, Advanced Lithography.

[8]  G. Kickelbick,et al.  Effect of interparticle interactions on size determination of zirconia and silica based systems – A comparison of SAXS, DLS, BET, XRD and TEM , 2012, Chemical physics letters.

[9]  Christopher K. Ober,et al.  Non-aqueous negative-tone development of inorganic metal oxide nanoparticle photoresists for next generation lithography , 2013, Advanced Lithography.

[10]  Li Li,et al.  Studying the Mechanism of Hybrid Nanoparticle Photoresists: Effect of Particle Size on Photopatterning , 2015 .

[11]  Warren Montgomery,et al.  Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography , 2011, Advanced Lithography.

[12]  Frederik Tielens,et al.  Ionic nanoparticle networks: development and perspectives in the landscape of ionic liquid based materials. , 2014, Chemical communications.

[13]  Marie Krysak,et al.  Extending resolution limits of EUV resist materials , 2015, Advanced Lithography.

[14]  Markos Trikeriotis,et al.  Oxide nanoparticle EUV resists: toward understanding the mechanism of positive and negative tone patterning , 2013, Advanced Lithography.

[15]  Markos Trikeriotis,et al.  Nanoparticle Photoresists: Ligand Exchange as a New, Sensitive EUV Patterning Mechanism , 2013 .