Pin accessibility evaluating model for improving routability of VLSI designs

Pin accessibility influences the routability of a design at the stage of block/chip assembling. The estimation model for pin accessibility in previous researches counts the total number of intersections between each pin and M2 routing tracks. It does not consider the variation of pin accessibility as the spacing between a pin and its neighboring pins and metal wires changes. Besides, it cannot properly deal with the off-grid pin access neither. In this paper, we propose a general model for pin accessibility estimation. In the model, all directions to connect to the boundary of a pin are under estimation. Off-grid pin access is also available. Experimental results show that the reduction rate of minimum area to complete the routing of a circuit can be 7.0% on average. Due to the diminishment of required area for routing, the total number of vias for higher metal layer also decrease under the same area constraint.

[1]  David Z. Pan,et al.  Self-Aligned Double Patterning Aware Pin Access and Standard Cell Layout Co-Optimization , 2015, IEEE Trans. Comput. Aided Des. Integr. Circuits Syst..

[2]  Bei Yu,et al.  Standard Cell Layout Regularity and Pin Access Optimization Considering Middle-of-Line , 2015, ACM Great Lakes Symposium on VLSI.

[3]  Cheng-Kok Koh,et al.  Optimization of placement solutions for routability , 2013, 2013 50th ACM/EDAC/IEEE Design Automation Conference (DAC).

[4]  Andrzej J. Strojwas,et al.  Co-Optimization of Circuits, Layout and Lithography for Predictive Technology Scaling Beyond Gratings , 2010, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

[5]  Meng-Kai Hsu,et al.  Design and manufacturing process co-optimization in nano-technology , 2014, ICCAD.

[6]  David Z. Pan,et al.  Self-Aligned Double Patterning Aware Pin Access and Standard Cell Layout Co-Optimization , 2015, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.

[7]  David Z. Pan,et al.  Standard cell pin access and physical design in advanced lithography , 2016, Advanced Lithography.

[8]  David Z. Pan,et al.  PARR: Pin access planning and regular routing for self-aligned double patterning , 2015, 2015 52nd ACM/EDAC/IEEE Design Automation Conference (DAC).

[9]  Tao Lin,et al.  POLAR 2.0: An effective routability-driven placer , 2014, 2014 51st ACM/EDAC/IEEE Design Automation Conference (DAC).

[10]  Kirti Bhanushali,et al.  Design Rule Development for FreePDK15: An Open Source Predictive Process Design Kit for 15nm FinFET Devices. , 2014 .

[11]  Tim Nieberg Gridless pin access in detailed routing , 2011, 2011 48th ACM/EDAC/IEEE Design Automation Conference (DAC).

[12]  Tao Huang,et al.  Ripple 2.0: High quality routability-driven placement via global router integration , 2013, 2013 50th ACM/EDAC/IEEE Design Automation Conference (DAC).

[13]  Jin Hu,et al.  A SimPLR method for routability-driven placement , 2011, 2011 IEEE/ACM International Conference on Computer-Aided Design (ICCAD).