Structural and gas response characterization of nano-size SnO2 films deposited by SILD method

The possibilities of successive ionic layer deposition (SILD) technology for deposition of nano-scalled SnO 2 films are discussed in this article. SnO2 films deposited using this technology contain porous agglomerated structures consisting of nano-size crystallites. Even after annealing at Tan = 800 ◦ C, the average size of crystallites does not exceed 6–7 nm. The average size of agglomerates depends on film thickness, and ranges from 20 to 80 nm. These SnO 2 films have good gas response especially to ozone and H 2. However, the rate of response to these gases is different. The response to ozone is fast, while the response to exposure to reducing gas, such as H 2, is slow. It is assumed that inter-crystallite gas diffusion in agglomerates limits the rate of response to reducing gases. © 2003 Elsevier B.V. All rights reserved.

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