X-Ray Lithography Using A KrF Laser-Produced Plasma

Experiments to demonstrate the feasibility of a small laser for x-ray lithography are discribed. Resist exposure experiment was performed by x-rays from a plasma produced by a KrF laser, 0.6 J/ 20 ns. With 50 shots exposure, a very fine pattern of 0.5 μm line & space was printed onto a resist EBR-9 at 3 cm from an iron plate target. The conditions for a laser-plasma to be a practical source for x-ray lithography are discussed.