Photon-induced dry etching of Si(100) in the VUV

[1]  N. Schwentner,et al.  SR-induced dry etching of semiconductors for microstructuring , 1995 .

[2]  Nikolaus Schwentner,et al.  Efficient dry etching of Si with vacuum ultraviolet light and XeF2 in a buffer gas , 1995 .

[3]  Takashi Goto,et al.  New microfabrication technique by synchrotron radiation‐excited etching: Use of noncontact mask on a submicrometer scale , 1994 .

[4]  N. Schwentner,et al.  Photochemical etching of GaAs with Cl2 induced by synchrotron radiation , 1993 .

[5]  Ken'ichiro Tanaka,et al.  Synchrotron radiation‐assisted etching of Si in the presence of reactive species produced by microwave discharge , 1993 .

[6]  Lo,et al.  XeF2 etching of Si(111): The geometric structure of the reaction layer. , 1993, Physical review. B, Condensed matter.

[7]  N. Schwentner,et al.  Reaction of Cu and Cl2 stimulated by synchrotron radiation , 1993 .

[8]  H. F. Winters,et al.  Surface Science Aspects of Etching Reactions , 1992 .

[9]  R. Osgood,et al.  Ultraviolet photon‐induced interaction of Cl2 with GaAs(110): Dissociation by means of charge transfer , 1992 .

[10]  Tsuneo Urisu,et al.  Oxygen addition effects in synchrotron radiation excited etching using SF6 , 1991 .

[11]  A. Hiraya,et al.  Synchrotron Radiation-Assisted Etching of Silicon Surface , 1987 .

[12]  M. Sekine,et al.  Photo‐assisted anisotropic etching of phosphorus‐doped polycrystalline silicon employing reactive species generated by a microwave discharge , 1986 .

[13]  D. Bäuerle Chemical processing with lasers , 1986 .

[14]  F. Houle Photoeffects on the fluorination of silicon. II. Kinetics of the initial response to light , 1984 .

[15]  F. Houle Photoeffects on the fluorination of silicon. I. Influence of doping on steady‐state phenomena , 1983 .

[16]  T. Chuang Laser‐enhanced gas–surface chemistry: Basic processes and applications , 1982 .