Defectivity evaluation of EUV reticles with etched multilayer image border by wafer printing analysis
暂无分享,去创建一个
Norihito Fukugami | Yo Sakata | Erik Verduijn | Rik Jonckheere | Emily Gallagher | Yutaka Kodera | Genta Watanabe
[1] Takeshi Isogawa,et al. Black border with etched multilayer on EUV mask , 2012, Other Conferences.
[2] Shinpei Kondo,et al. Impact of an etched EUV mask black border on imaging and overlay , 2012, Photomask Technology.
[3] Yoshifumi Sakamoto,et al. EUV mask black border evolution , 2014, Photomask Technology.