Thermally stable amorphous (AlMoNbSiTaTiVZr)50N50 nitride film as diffusion barrier in copper metallization
暂无分享,去创建一个
Jien-Wei Yeh | Ming-Hung Tsai | J. Gan | J. Yeh | M. Tsai | Chun-Wen Wang | Chia-Han Lai | Jon-Yiew Gan | Chia-Han Lai | Chun-Wen Wang
[1] J. Yeh,et al. Microstructure characterization of AlxCoCrCuFeNi high-entropy alloy system with multiprincipal elements , 2005 .
[2] J. Yeh,et al. Selected corrosion behaviors of a Cu0.5NiAlCoCrFeSi bulk glassy alloy in 288 °C high-purity water , 2006 .
[3] M. Nastasi,et al. Crystallization and oxidation behavior of Mo-Si-N coatings , 1995 .
[4] M. Nicolet,et al. Amorphous Ta–Si–N thin‐film alloys as diffusion barrier in Al/Si metallizations , 1990 .
[5] Jen‐Sue Chen,et al. Influence of Ta/Si atomic ratio on the interdiffusion between Ta-Si-N and Cu at elevated temperature , 2003 .
[6] A. Inoue. Stabilization of metallic supercooled liquid and bulk amorphous alloys , 2000 .
[7] J. Yeh. Recent progress in high-entropy alloys , 2006 .
[8] M. Pons,et al. Application of equilibrium thermodynamics to the development of diffusion barriers for copper metallization (invited) , 2000 .
[9] M. Nicolet,et al. Reactively sputtered Ti-Si-N films I. Physical properties , 1997 .
[10] M. Nicolet,et al. Evaluation of amorphous (Mo, Ta, W)SiN diffusion barriers for 〈Si〉|Cu metallizations , 1993 .
[11] M. Nicolet. Ternary amorphous metallic thin films as diffusion barriers for Cu metallization , 1995 .
[12] J. S. Chen,et al. Amorphous Ta-Si-N diffusion barriers in Si/Al and Si/Cu metallizations , 1991 .
[13] Ki-Bum Kim,et al. Improved diffusion barrier by stuffing the grain boundaries of TiN with a thin Al interlayer for Cu metallization , 2001 .
[14] M. Nicolet. Reactively sputtered ternary films of the type TM–Si–N and their properties (TM=early transition metal) , 2000 .
[15] Jien-Wei Yeh,et al. Industrial development of high-entropy alloys , 2006 .
[16] J. Yeh,et al. Mechanical performance of the AlxCoCrCuFeNi high-entropy alloy system with multiprincipal elements , 2005 .
[17] Francis J. DiSalvo. Challenges and opportunities in solid-state chemistry , 2000 .
[18] J. Pelleg,et al. Diffusion barrier properties of amorphous TiB2 for application in Cu metallization , 2002 .
[19] W. L. Johnson,et al. A highly processable metallic glass: Zr[sub 41. 2]Ti[sub 13. 8]Cu[sub 12. 5]Ni[sub 10. 0]Be[sub 22. 5] , 1993 .
[20] T. J. Yang,et al. An optimal quasisuperlattice design to further improve thermal stability of tantalum nitride diffusion barriers , 2000 .
[21] A. L. Greer,et al. Confusion by design , 1993, Nature.
[22] J. Yeh,et al. Mechanical properties of a bulk Cu0.5NiAlCoCrFeSi glassy alloy in 288°C high-purity water , 2005 .
[23] J. Yeh,et al. Wear resistance and high-temperature compression strength of Fcc CuCoNiCrAl0.5Fe alloy with boron addition , 2004 .
[24] Eric Eisenbraun,et al. Ultrathin Diffusion Barriers/Liners for Gigascale Copper Metallization , 2000 .
[25] Jien-Wei Yeh,et al. Hyperfine splitting from magnetic boride domains embedded in Fe-Co-Ni-Al-B-Si alloy , 2006 .
[26] Jaehyeong Kim,et al. Diffusion barrier and electrical characteristics of a self-aligned MgO layer obtained from a Cu(Mg) alloy film , 2000 .
[27] R. Ray,et al. Metallic glass formation and properties in Zr and Ti alloyed with Be—I the binary Zr-Be and Ti-Be systems☆ , 1979 .
[28] W. Johnson,et al. A highly processable metallic glass: Zr41.2Ti13.8Cu12.5Ni10.0Be22.5 , 1993 .
[29] T. Shun,et al. Nanostructured High‐Entropy Alloys with Multiple Principal Elements: Novel Alloy Design Concepts and Outcomes , 2004 .