When are transmission-line effects important for on-chip interconnections?

Short, medium, and long on-chip interconnections having linewidths of 0.45-52 /spl mu/m are analyzed in a five-metal-layer structure. We study capacitive coupling for short lines, inductive coupling for medium-length lines, inductance and resistance of the current return path in the power buses, and line resistive losses for the global wiring. Design guidelines and technology changes are proposed to achieve minimum delay and contain crosstalk for local and global wiring. Conditional expressions are given to determine when transmission-line effects are important for accurate delay and crosstalk prediction.

[1]  Gerard V. Kopcsay,et al.  High-Speed Signal Propagation on Lossy Transmission Lines , 1990, IBM J. Res. Dev..

[2]  Robert H. Dennard,et al.  Modeling and characterization of long on-chip interconnections for high-performance microprocessors , 1995, IBM Journal of Research and Development.

[3]  Barry J. Rubin,et al.  Calculation of multi-port parameters of electronic packages using a general purpose electromagnetics code , 1993, Proceedings of IEEE Electrical Performance of Electronic Packaging.

[4]  G. A. Sai-Halasz,et al.  Performance trends in high-end processors , 1995, Proc. IEEE.

[5]  J. R. Yee,et al.  A model and algorithm for interconnecting two WANs , 1990, 1990 IEEE International Conference on Systems, Man, and Cybernetics Conference Proceedings.