Influence of SiO2 undercoat on the laser-induced damage threshold of 355 nm LaF3/AlF3 multilayer reflectors

In the pursuit for 355 nm high laser resistant dielectric coatings, layer-pair number of 10 and 15 LaF3/AlF3 high reflectors with and without SiO2 undercoat were prepared on BK7 substrates. The results indicate considerable increase in 355 nm laser-induced damage threshold (LIDT) for samples with undercoat. The samples were analyzed in Normalized Electric Field Intensity distribution, total stress, damage depth and damage morphology, revealing that SiO2 undercoat benefits fluoride coatings by shielding substrate defects and reducing coating defects.

[1]  Laser damage thresholds at short wavelengths , 1982, IEEE Journal of Quantum Electronics.

[2]  Jianda Shao,et al.  Employing oxygen-plasma posttreatment to improve the laser-induced damage threshold of ZrO2 films prepared by the electron-beam evaporation method. , 2004, Optics letters.

[3]  Norbert Kaiser,et al.  Influence of substrate cleaning on LIDT of 355 nm HR coatings , 1997, Laser Damage.

[4]  J. Néauport,et al.  Polishing-induced contamination of fused silica optics and laser induced damage density at 351 nm. , 2005, Optics express.

[5]  Cheng Xu,et al.  Influence of SiO2 additional layers on the laser induced damage threshold of Ta2O5 films , 2008 .

[6]  Ming Zhou,et al.  Calculation of temperature fields with a film-substrate interfacial layer model to discuss the layer-pair number effects on the damage thresholds of LaF3/MgF2 high reflectors at 355 nm , 2010 .

[7]  Hua Yu,et al.  Study on the feasibility of double stack high reflector coating at 355 nm , 2012 .

[8]  Minghong Yang,et al.  Influence of subsurface defects on 355 nm laser damage resistance of monolayer and multilayer coatings , 2009, Laser Damage.

[9]  Takao Izawa,et al.  Damage threshold of fluoride HR coatings at 352 nm , 1993, Laser Damage.

[10]  Zhengxiu Fan,et al.  Understanding of the abnormal wavelength effect of overcoats , 1991, Laser Damage.

[11]  S. Papernov,et al.  Using gold nanoparticles as artificial defects in thin films: What have we learned about laser-induced damage driven by localized absorbers? , 2006, SPIE Laser Damage.

[12]  S. Papernov,et al.  Localized absorption effects during 351 nm, pulsed laser irradiation of dielectric multilayer thin films , 1997 .

[13]  Z. Fan,et al.  Mechanical stress in 355 nm LaF3/MgF2 high reflectors with various layer-pair number and methods for reduction , 2010 .

[14]  G. Stoney.  The Tension of Metallic Films Deposited by Electrolysis , 1909 .

[15]  S. Papernov,et al.  Two mechanisms of crater formation in ultraviolet-pulsed-laser irradiated SiO2 thin films with artificial defects , 2005 .

[16]  Semyon Papernov,et al.  AFM-mapped nanoscale absorber-driven laser damage in UV high-reflector multilayers , 1996, Laser Damage.

[17]  Jean DiJon,et al.  Nano absorbing centers: a key point in the laser damage of thin films , 1997, Laser Damage.

[18]  Jianda Shao,et al.  Study of Al2O3/MgF2 HR coatings at 355 nm , 2005 .

[19]  Charles K. Carniglia,et al.  Contamination of surfaces prior to optical coating by in-situ total internal reflection microscopy , 1994, Laser Damage.

[20]  Gary E. Loomis,et al.  Damage thresholds of fluoride multilayers at 355 nm , 1993, Laser Damage.