论文信息 - PMMA and polystyrene films modification under ion implantation studied by spectroscopic ellipsometry

PMMA and polystyrene films modification under ion implantation studied by spectroscopic ellipsometry

We have applied spectroscopic ellipsometry with binary polarization modulation to study the refractive index n(λ) and extinction coefficient k(λ) spectra of as-deposited and irradiated with nitrogen ions polymethylmethacrylate (PMMA) and polystyrene (PS) films in 300-1030 nm range. The results of performed investigation confirmed the possibility and estimate restrictions of the ion implantation for local change the refractive index of polymeric materials.

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