Block Copolymer Lithography
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C. Grant Willson | Christopher J. Ellison | Michael J. Maher | C. M. Bates | Dustin W. Janes | Christopher M. Bates | C. Willson | C. Ellison | C. J. Ellison
[1] Xiaodan Gu,et al. High Aspect Ratio Sub‐15 nm Silicon Trenches From Block Copolymer Templates , 2012, Advanced materials.
[2] A. Bosse,et al. Effects of segregation strength and an external field on the thermal line edge and line width roughness spectra of a diblock copolymer resist , 2011 .
[3] Marc A. Hillmyer,et al. Polylactide-poly(dimethylsiloxane)-polylactide triblock copolymers as multifunctional materials for nanolithographic applications. , 2010, ACS nano.
[4] E. Kramer,et al. Graphoepitaxy of Spherical Domain Block Copolymer Films , 2001 .
[5] E. W. Edwards,et al. Directed Assembly of Block Copolymer Blends into Nonregular Device-Oriented Structures , 2005, Science.
[6] Juan J. de Pablo,et al. Combining advanced lithographic techniques and self-assembly of thin films of diblock copolymers to produce templates for nanofabrication , 2000 .
[7] Craig J. Hawker,et al. A Simple Route to Metal Nanodots and Nanoporous Metal Films , 2002 .
[8] Y. Jung,et al. Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer. , 2007, Nano letters.
[9] Eric W. Cochran,et al. Temperature Dependence of Order, Disorder, and Defects in Laterally Confined Diblock Copolymer Cylinder Monolayers , 2005 .
[10] C. M. Bates,et al. Multiblock Polymers: Panacea or Pandora’s Box? , 2012, Science.
[11] J. Peeling,et al. Application of ESCA to polymer chemistry. VIII. Surface structures of AB block copolymers of polydimethylsiloxane and polystyrene , 1976 .
[12] Craig J. Hawker,et al. Efficient Surface Neutralization and Enhanced Substrate Adhesion through Ketene Mediated Crosslinking and Functionalization , 2013 .
[13] D. Sanders,et al. Advances in patterning materials for 193 nm immersion lithography. , 2010, Chemical reviews.
[14] C. Hawker,et al. Controlling Polymer-Surface Interactions with Random Copolymer Brushes , 1997, Science.
[15] Timothy P. Lodge,et al. Synthesis, Characterization, and Interaction Strengths of Difluorocarbene-Modified Polystyrene−Polyisoprene Block Copolymers , 2000 .
[16] Dieter Van Den Heuvel,et al. Defect source analysis of directed self-assembly process (DSA of DSA) , 2013, Advanced Lithography.
[17] Caroline A. Ross,et al. High-Aspect-Ratio Perpendicular Orientation of PS-b-PDMS Thin Films under Solvent Annealing. , 2012, ACS macro letters.
[18] E. W. Edwards,et al. Binary blends of diblock copolymers as an effective route to multiple length scales in perfect directed self-assembly of diblock copolymer thin films , 2006 .
[19] Ofir Montal,et al. Directed self-assembly defectivity assessment. Part II , 2012, Advanced Lithography.
[20] E. Bryan Coughlin,et al. Synthesis of Semicrystalline/Fluorinated Side-Chain Crystalline Block Copolymers and Their Bulk and Thin Film Nanoordering , 2013 .
[21] Thomas H. Epps,et al. Directed Block Copolymer Thin Film Self-Assembly: Emerging Trends in Nanopattern Fabrication , 2013 .
[22] Paul F. Nealey,et al. Decoupling Bulk Thermodynamics and Wetting Characteristics of Block Copolymer Thin Films. , 2012, ACS macro letters.
[23] M. Morris,et al. Solvent Vapor Annealing of Block Polymer Thin Films , 2013 .
[24] Chi-Chun Liu,et al. Pattern placement accuracy in block copolymer directed self-assembly based on chemical epitaxy. , 2013, ACS nano.
[25] S. V. Sreenivasan,et al. Nanoscale Manufacturing Enabled by Imprint Lithography , 2008 .
[26] A. Bosse,et al. Phase-Field Simulation of Long-Wavelength Line Edge Roughness in Diblock Copolymer Resists , 2010 .
[27] Mark A. Hartney,et al. BLOCK COPOLYMERS AS BILEVEL RESISTS. , 1985 .
[28] Craig J. Hawker,et al. Using Surface Active Random Copolymers To Control the Domain Orientation in Diblock Copolymer Thin Films , 1998 .
[29] Wei Zheng,et al. Morphology of ABC Triblock Copolymers , 1995 .
[30] J. Weinhold,et al. Photonic Polyethylene from Self-Assembled Mesophases of Polydisperse Olefin Block Copolymers , 2009 .
[31] John A. Rogers,et al. Polymer Imprint Lithography with Molecular-Scale Resolution , 2004 .
[32] E. Helfand,et al. Block Copolymer Theory. 4. Narrow Interphase Approximation , 1976 .
[33] Russell B. Thompson,et al. Equilibrium behavior of symmetric ABA triblock copolymer melts , 1999 .
[34] Christopher J. Ellison,et al. Polydispersity effects in poly(isoprene-b-styrene-b-ethylene oxide) triblock terpolymers. , 2009, The Journal of chemical physics.
[35] T. Russell. Changes in polystyrene and poly(methyl methacrylate) interactions with isotopic substitution , 1993 .
[36] A. Whittaker,et al. Control of the orientation of symmetric poly(styrene)-block-poly(D,L-lactide) block copolymers using statistical copolymers of dissimilar composition. , 2012, Langmuir : the ACS journal of surfaces and colloids.
[37] M. Stamm,et al. Comparison of interfacial width of block copolymers of d(8)-poly(methyl methacrylate) with various poly(n-alkyl methacrylate)s and the respective homopolymer pairs as measured by neutron reflection , 1999 .
[38] M. Hillmyer. Polydisperse block copolymers: Don't throw them away , 2007 .
[39] Paul F. Nealey,et al. Using Self-Assembled Monolayers Exposed to X-rays To Control the Wetting Behavior of Thin Films of Diblock Copolymers , 2000 .
[40] G. Fredrickson,et al. Block copolymer thermodynamics: theory and experiment. , 1990, Annual review of physical chemistry.
[41] Soojin Park,et al. A simple route to highly oriented and ordered nanoporous block copolymer templates. , 2008, ACS nano.
[42] Marc A. Hillmyer,et al. Synthesis, Thermodynamics, and Dynamics of Poly(4-tert-butylstyrene-b-methyl methacrylate) , 2012 .
[43] Seth B Darling,et al. A route to nanoscopic materials via sequential infiltration synthesis on block copolymer templates. , 2011, ACS nano.
[44] Christopher J. Ellison,et al. Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications. , 2012, ACS nano.
[45] Joy Y. Cheng,et al. Dense Self‐Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers , 2008 .
[46] Marcus Müller,et al. Rapid Directed Assembly of Block Copolymer Films at Elevated Temperatures , 2008 .
[47] K. Carter. An age-old printing process goes nano. , 2010, ACS nano.
[48] Lei Wan,et al. Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films , 2013 .
[49] Joel K. W. Yang,et al. Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates , 2008, Science.
[50] Joy Cheng,et al. Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography , 2001 .
[51] V. Deline,et al. Surface-induced orientation of symmetric, diblock copolymers: a secondary ion mass spectrometry study , 1989 .
[52] V. Deline,et al. Characteristics of the surface-induced orientation for symmetric diblock PS/PMMA copolymers , 1989 .
[53] V. Ganesan,et al. Highly asymmetric lamellar nanopatterns via block copolymer blends capable of hydrogen bonding. , 2012, ACS nano.
[54] Mark Somervell,et al. Pattern scaling with directed self assembly through lithography and etch process integration , 2012, Advanced Lithography.
[55] Juan J. de Pablo,et al. Free Energy of Defects in Ordered Assemblies of Block Copolymer Domains. , 2012, ACS macro letters.
[56] E. Han,et al. Bulk and Thin Film Morphological Behavior of Broad Dispersity Poly(styrene-b-methyl methacrylate) Diblock Copolymers , 2013 .
[57] Christopher J. Ellison,et al. Light-Activated Replication of Block Copolymer Fingerprint Patterns , 2013 .
[58] Craig J. Hawker,et al. Facile Routes to Patterned Surface Neutralization Layers for Block Copolymer Lithography , 2007 .
[59] Eric M. Gullikson,et al. Measuring the Structure of Epitaxially Assembled Block Copolymer Domains with Soft X-ray Diffraction , 2010 .
[60] R. Ruiz,et al. Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition , 2012 .
[61] Christopher J. Ellison,et al. Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains , 2012, Science.
[62] Eric W. Cochran,et al. Design of ABC Triblock Copolymers near the ODT with the Random Phase Approximation , 2003 .
[63] Michael J. Maher,et al. Block Copolymer Orientation Control Using a Top-Coat Surface Treatment , 2012 .
[64] S. Perrier,et al. Ordered Microphase Separation in Thin Films of PMMA−PBA Synthesized by RAFT: Effect of Block Polydispersity , 2009 .
[65] G. Whitesides,et al. Soft lithography for micro- and nanoscale patterning , 2010, Nature Protocols.
[66] Craig J Hawker,et al. A Generalized Approach to the Modification of Solid Surfaces , 2005, Science.
[67] Stephen Y. Chou,et al. Imprint lithography with sub-10 nm feature size and high throughput , 1997 .
[68] Christopher J. Ellison,et al. Synthesis and thin‐film orientation of poly(styrene‐block‐trimethylsilylisoprene) , 2013 .
[69] Henry I. Smith,et al. Fabrication of nanostructures with long-range order using block copolymer lithography , 2002 .
[70] Timothy M. Gillard,et al. Fluctuations, Order, and Disorder in Short Diblock Copolymers , 2013 .
[71] C. Willson,et al. Step & flash imprint lithography , 2005 .
[72] Ralph R. Dammel,et al. Cost-Effective Sub-20 nm Lithography: Smart Chemicals to the Rescue , 2011 .
[73] M. Matsen. Architectural Effect on the Surface Tension of an ABA Triblock Copolymer Melt , 2010 .
[74] Y. Lyatskaya,et al. Lamellar structure formation in the mixture of two cylinder‐forming block copolymers , 1994 .
[75] Frank S. Bates,et al. Model ABC triblock copolymers and blends near the order-disorder transition , 2002 .
[76] D. R. Paul,et al. Interaction energies for blends of poly(methyl methacrylate), polystyrene, and poly(.alpha.-methylstyrene) by the critical molecular weight method , 1993 .
[77] D. Herr. Directed block copolymer self-assembly for nanoelectronics fabrication , 2011 .
[78] A. Mayes,et al. Microphase separation in multiblock copolymer melts , 1989 .
[79] Y. Jung,et al. Fabrication of diverse metallic nanowire arrays based on block copolymer self-assembly. , 2010, Nano letters.
[80] R. J. Kline,et al. Directed Self-Assembly of Lamellar Copolymers: Effects of Interfacial Interactions on Domain Shape. , 2012, ACS macro letters.
[81] Soojin Park,et al. Macroscopic 10-Terabit–per–Square-Inch Arrays from Block Copolymers with Lateral Order , 2009, Science.
[82] P. Nealey,et al. In situ metallization of patterned polymer brushes created by molecular transfer print and fill , 2013, Nanotechnology.
[83] C. Grant Willson,et al. Thin Film Self-Assembly of Poly(trimethylsilylstyrene-b-D,L-lactide) with Sub-10 nm Domains , 2012 .
[84] E. Kramer,et al. Effect of film thickness and domain spacing on defect densities in directed self-assembly of cylindrical morphology block copolymers. , 2012, ACS nano.
[85] Andrew L. Schmitt,et al. Unexpected consequences of block polydispersity on the self-assembly of ABA triblock copolymers. , 2012, Journal of the American Chemical Society.
[86] T. Albrecht,et al. Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned media. , 2011, ACS nano.
[87] G. Fredrickson,et al. Can a single function for χ account for block copolymer and homopolymer blend phase behavior , 1998 .
[88] Marc A. Hillmyer,et al. Nanoporous materials from block copolymer precursors , 2005 .
[89] Roel Gronheid,et al. Comparison of directed self-assembly integrations , 2012, Other Conferences.
[90] M. S. Onses,et al. Site‐Specific Placement of Au Nanoparticles on Chemical Nanopatterns Prepared by Molecular Transfer Printing Using Block‐Copolymer Films , 2011 .
[91] Lei Wan,et al. Bit Patterned Media at 1 Tdot/in2 and Beyond , 2013, IEEE Transactions on Magnetics.
[92] P. Nealey,et al. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates , 2003, Nature.
[93] Chi-Chun Liu,et al. Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography , 2008 .
[94] Eungnak Han,et al. One‐Step Direct‐Patterning Template Utilizing Self‐Assembly of POSS‐Containing Block Copolymers , 2009, Advanced materials.
[95] Craig J. Hawker,et al. Interfacial Segregation in Disordered Block Copolymers: Effect of Tunable Surface Potentials , 1997 .
[96] Kim Y. Lee,et al. Advanced Lithography for Bit Patterned Media , 2009, IEEE Transactions on Magnetics.
[97] S. Sibener,et al. Dynamics of molecular and polymeric interfaces probed with atomic beam scattering and scanning probe imaging. , 2012, Faraday discussions.
[98] Audrey M. Bowen,et al. Transfer Printing Techniques for Materials Assembly and Micro/Nanodevice Fabrication , 2012, Advanced materials.
[99] Michael T. Sheehan,et al. High chi polymer development for DSA applications using RAFT technology , 2013, Advanced Lithography.
[100] Christopher J. Ellison,et al. Polymeric cross-linked surface treatments for controlling block copolymer orientation in thin films. , 2011, Langmuir : the ACS journal of surfaces and colloids.
[101] Easan Sivaniah,et al. SAXS Analysis of the Order−Disorder Transition and the Interaction Parameter of Polystyrene-block-poly(methyl methacrylate) , 2008 .
[102] Christopher Harrison,et al. Block copolymer lithography: Periodic arrays of ~1011 holes in 1 square centimeter , 1997 .
[103] Thomas P. Russell,et al. Temperature dependence of the interaction parameter of polystyrene and poly(methyl methacrylate) , 1990 .
[104] Erick Sutanto,et al. Hierarchical patterns of three-dimensional block-copolymer films formed by electrohydrodynamic jet printing and self-assembly. , 2013, Nature nanotechnology.
[105] W. Hinsberg,et al. Block copolymer based nanostructures: materials, processes, and applications to electronics. , 2010, Chemical reviews.
[106] Juan J de Pablo,et al. Directed assembly of non-equilibrium ABA triblock copolymer morphologies on nanopatterned substrates. , 2012, ACS nano.
[107] E. Kramer,et al. Quantification of Temperature-Dependent Order in Graphoepitaxially Aligned Monolayer and Bilayer Films of Cylindrical Morphology Block Copolymer , 2013 .
[108] Marc A. Hillmyer,et al. Influence of Polydispersity on the Self-Assembly of Diblock Copolymers , 2005 .
[109] Juan J. de Pablo,et al. Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features , 2013 .
[110] Eric W. Cochran,et al. Effect of Chain Architecture and Surface Energies on the Ordering Behavior of Lamellar and Cylinder Forming Block Copolymers , 2006 .