论文信息 - Three-dimensional Thermal Analysis of a Waveguide Ge/Si Photodiode

Three-dimensional Thermal Analysis of a Waveguide Ge/Si Photodiode

The spatial temperature distribution of a high power Ge/Si waveguide n-i-p photodiode is experimentally obtained using a time-domain thermoreflectance imaging technique. Measurement results are shown to be in good agreement with simulated values.

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