Analytical device model for submicrometer MOSFET's

A drain current model applicable to deep submicrometer MOSFETs is proposed. This pseudo-two-dimensional device model includes the velocity overshoot effect by using the extended-drift-diffusion (EDD) model. Calculated current-voltage characteristics agree well with the reported experimental data for deep submicrometer MOSFETs. The model is applicable to small-geometry MOSFETs down to L=0.1 mu m, whereas conventional modes without the velocity overshoot are valid to 0.25 mu m. >

[1]  R. W. Coen,et al.  Velocity of surface carriers in inversion layers on silicon , 1980 .

[2]  I. Eisele,et al.  Velocity saturation in short channel field effect transistors , 1980 .

[3]  C.G. Sodini,et al.  The effect of high fields on MOS device and circuit performance , 1984, IEEE Transactions on Electron Devices.

[4]  Cheng T. Wang A new set of semiconductor equations for computer simulation of submicron devices , 1985 .

[5]  H.I. Smith,et al.  Observation of electron velocity overshoot in sub-100-nm-channel MOSFET's in Silicon , 1985, IEEE Electron Device Letters.

[6]  S. Laux,et al.  Monte Carlo analysis of electron transport in small semiconductor devices including band-structure and space-charge effects. , 1988, Physical review. B, Condensed matter.

[7]  Shinichi Takagi,et al.  On the universality of inversion-layer mobility in n- and p-channel MOSFETs , 1988, Technical Digest., International Electron Devices Meeting.

[8]  Y.A. El-Mansy,et al.  A simple two-dimensional model for IGFET operation in the saturation region , 1977, IEEE Transactions on Electron Devices.

[9]  J. T. Clemens,et al.  Characterization of the electron mobility in the inverted <100> Si surface , 1979, 1979 International Electron Devices Meeting.

[10]  P. J. Price On the flow equation in device simulation , 1988 .

[11]  D. Kern,et al.  High transconductance and velocity overshoot in NMOS devices at the 0.1- mu m gate-length level , 1988, IEEE Electron Device Letters.

[12]  J. Plummer,et al.  Electron mobility in inversion and accumulation layers on thermally oxidized silicon surfaces , 1980 .

[13]  H. Sibbert,et al.  Model and performance of hot-electron MOS transistors for VLSI , 1979 .

[14]  G. Baccarani,et al.  An investigation of steady-state velocity overshoot in silicon , 1985 .

[15]  S. Manzini,et al.  High-field drift velocity of electrons in silicon inversion layers , 1988 .

[16]  F. Fang,et al.  Hot Electron Effects and Saturation Velocities in Silicon Inversion Layers , 1970 .

[17]  D. F. Nelson,et al.  High‐field drift velocity of electrons at the Si–SiO2 interface as determined by a time‐of‐flight technique , 1983 .

[18]  Y. Okamoto,et al.  Drift-Velocity Saturation of Holes in Si Inversion Layers , 1971 .

[19]  Robert G. Meyer,et al.  An engineering model for short-channel MOS devices , 1988 .

[20]  R.H. Dennard,et al.  Design and experimental technology for 0.1-µm gate-length low-temperature operation FET's , 1987, IEEE Electron Device Letters.