Postiive tone resists based on network deploymerization of molecular resists
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[1] Tsuguo Yamaoka,et al. Novel dual-mode photoresist based on cationic polymerization and acidolysis , 1993 .
[2] Clifford L. Henderson,et al. Negative-tone molecular resists based on cationic polymerization , 2009, Advanced Lithography.
[3] Clifford L. Henderson,et al. Bond contribution model for the prediction of glass transition temperature in polyphenol molecular glass resists , 2009 .
[4] Clifford L. Henderson,et al. Epoxide functionalized molecular resists for high resolution electron-beam lithography , 2008 .
[5] Todd R. Younkin,et al. A new technique for studying photo-acid generator chemistry and physics in polymer films using on-wafer ellipsometry and acid-sensitive dyes , 2008, SPIE Advanced Lithography.
[6] Clifford L. Henderson,et al. Influence of solubility switching mechanism on resist performance in molecular glass resists , 2007 .
[7] Clifford L. Henderson,et al. Comparison of positive tone versus negative tone resist pattern collapse behaviora) , 2010 .
[8] Clifford L. Henderson,et al. High resolution negative tone molecular resist based on di-functional epoxide polymerization , 2009 .
[9] Iwao Nishiyama,et al. LER evaluation of molecular resist for EUV lithography , 2007 .
[10] Jan Szymanowski,et al. Extraction and pertraction of phenol through bulk liquid membranes , 2005 .
[11] Clifford L. Henderson,et al. Thin film buckling as a method to explore the effect of reactive rinse treatments on the mechanical properties of resist thin films , 2010, Advanced Lithography.
[12] Mingxing Wang,et al. Novel anionic photoacid generator (PAGs) and photoresist for sub-50-nm patterning by EUVL and EBL , 2007, SPIE Advanced Lithography.
[13] Jing Cheng,et al. Non-traditional resist designs using molecular resists: positive tone cross-linked and non-chemically amplified molecular resists , 2010, Advanced Lithography.
[14] Clifford L. Henderson,et al. Methods to explore and prevent pattern collapse in thin film lithography , 2010, Advanced Lithography.
[15] Clifford L. Henderson,et al. Aqueous and solvent developed negative-tone molecular resists , 2010, Advanced Lithography.
[16] T. Taguchi,et al. Highly sensitive positive resist based on vinyl ether chemistry , 1995 .
[17] Clifford L. Henderson,et al. Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups , 2009 .