Consistent growth and successive development of GaN-HEMT for wireless communication

The world's first commercialized GaN-HEMTs for power amplifiers in wireless basestation transmitter systems were successfully launched. The device characteristics of GaN-HEMT on SiC are superior to those of Si LDMOS-FET owing to the material properties. However, the mass-production of GaN-HEMT was significantly difficult for every semiconductor vender in the past. We developed an appropriate screening procedure and improve the quality of SiC substrate. Those measures enabled high volume production of GaN-HEMTs. In order to maximize the high efficiency characteristics, an inverse class-F design was applied to the output matching network inside a package. Various application engineering solutions, such as Doherty amplifier designs and DPD adaptation examples, were provided quickly for user friendliness and convenience. GaN-HEMTs have achieved considerable market position through successfully performed development and improvement.

[1]  Norihiko Ui,et al.  A 2.6GHz band 537W peak power GaN HEMT asymmetric Doherty amplifier with 48% drain efficiency at 7dB , 2012, 2012 IEEE/MTT-S International Microwave Symposium Digest.

[2]  H. Deguchi,et al.  A 2.5–2.7GHz broadband 40W GaN HEMT Doherty amplifier with higher than 45% drain efficiency for multi-band application , 2012, 2012 IEEE Topical Conference on Power Amplifiers for Wireless and Radio Applications.

[3]  S. Sano,et al.  A 40W GaN HEMT Doherty Power Amplifier with 48% Efficiency for WiMAX Applications , 2007, 2007 IEEE Compound Semiconductor Integrated Circuits Symposium.

[4]  S. Sano,et al.  A 80W 2-stage GaN HEMT Doherty Amplifier with 50dBc ACLR, 42% Efficiency 32dB Gain with DPD for W-CDMA Base station , 2007, 2007 IEEE/MTT-S International Microwave Symposium.