Coarse-grained molecular dynamics modeling of the kinetics of lamellar block copolymer defect annealing
暂无分享,去创建一个
Clifford L. Henderson | Peter J. Ludovice | Richard A. Lawson | Andrew J. Peters | Benjamin D. Nation | C. Henderson | P. Ludovice
[1] M. Guenza,et al. Effective Soft-Core Potentials and Mesoscopic Simulations of Binary Polymer Mixtures , 2010, 1004.0277.
[2] William D. Hinsberg,et al. Self-assembly patterning for sub-15nm half-pitch: a transition from lab to fab , 2011, Advanced Lithography.
[3] Joy Y. Cheng,et al. Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist. , 2010, ACS nano.
[4] A. Ryan,et al. Order-disorder transition in poly(oxyethylene)-poly(oxybutylene) diblock copolymers , 1996 .
[5] Christopher J. Ellison,et al. Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications. , 2012, ACS nano.
[6] P. Nealey,et al. Theoretically informed coarse grain simulations of block copolymer melts: method and applications , 2009 .
[7] Joy Y. Cheng,et al. Dense Self‐Assembly on Sparse Chemical Patterns: Rectifying and Multiplying Lithographic Patterns Using Block Copolymers , 2008 .
[8] A. Barnes,et al. Neutron and x-ray diffraction studies of liquids and glasses , 2005 .
[9] Clifford L. Henderson,et al. Development of realistic potentials for the simulation of directed self-assembly of PS-PMMA di-block copolymers , 2011, Advanced Lithography.
[10] E. Lorch. Neutron diffraction by germania, silica and radiation-damaged silica glasses , 1969 .
[11] Joy Y. Cheng,et al. Nanostructure engineering by templated self-assembly of block copolymers , 2004, Nature materials.
[12] E. Kramer,et al. Graphoepitaxy of Spherical Domain Block Copolymer Films , 2001 .
[13] Joshua A. Anderson,et al. General purpose molecular dynamics simulations fully implemented on graphics processing units , 2008, J. Comput. Phys..
[14] L. Leibler. Theory of Microphase Separation in Block Copolymers , 1980 .
[15] Clifford L. Henderson,et al. Detailed molecular dynamics studies of block copolymer directed self-assembly: Effect of guiding layer properties , 2013 .
[16] Clifford L. Henderson,et al. Simulation study of the effect of differences in block energy and density on the self-assembly of block copolymers , 2014 .
[17] Bong Hoon Kim,et al. Ultralarge-area block copolymer lithography enabled by disposable photoresist prepatterning. , 2010, ACS nano.
[18] Eungnak Han,et al. Integration of block copolymer directed assembly with 193 immersion lithography , 2010 .
[19] Marcus Müller,et al. Directed self-assembly of block copolymers for nanolithography: fabrication of isolated features and essential integrated circuit geometries. , 2007, ACS nano.
[20] Bumjoon J. Kim,et al. Proximity injection of plasticizing molecules to self-assembling polymers for large-area, ultrafast nanopatterning in the sub-10-nm regime. , 2013, ACS nano.
[21] K Schulten,et al. VMD: visual molecular dynamics. , 1996, Journal of molecular graphics.
[22] Ralph R. Dammel,et al. Cost-Effective Sub-20 nm Lithography: Smart Chemicals to the Rescue , 2011 .
[23] Richard A. Lawson,et al. Free energy difference of pitch variation and calculation of the order–disorder transition in block copolymer systems using thermodynamic integration , 2015 .
[24] Jincheng Du,et al. A molecular dynamics simulation interpretation of neutron and x-ray diffraction measurements on single phase Y2O3–Al2O3 glasses , 2009, Journal of physics. Condensed matter : an Institute of Physics journal.
[25] Xiaodan Gu,et al. An In Situ Grazing Incidence X‐Ray Scattering Study of Block Copolymer Thin Films During Solvent Vapor Annealing , 2014, Advanced materials.
[26] G. Fredrickson,et al. Can a single function for χ account for block copolymer and homopolymer blend phase behavior , 1998 .
[27] Clifford L. Henderson,et al. Coarse grained molecular dynamics model of block copolymer directed self-assembly , 2013 .
[28] E. Helfand,et al. Fluctuation effects in the theory of microphase separation in block copolymers , 1987 .
[29] P. Flory. Principles of polymer chemistry , 1953 .
[30] W. Hinsberg,et al. Surface patterns from block copolymer self-assembly , 2008 .
[31] Marcus Müller,et al. Defect removal in the course of directed self-assembly is facilitated in the vicinity of the order-disorder transition. , 2014, Physical review letters.
[32] M. Imai,et al. Order-Disorder Transition of Symmetric Poly(styrene-b-2-vinylpyridine) in Bulk and Solution , 1998 .
[33] D. E. Thornton,et al. Structural Aspects of the Electrical Resistivity of Binary Alloys , 1970 .
[34] Juan J. de Pablo,et al. Free Energy of Defects in Ordered Assemblies of Block Copolymer Domains. , 2012, ACS macro letters.
[35] John Ziman,et al. A theory of the electrical properties of liquid metals , 1965 .
[36] Clifford L. Henderson,et al. Understanding defects in DSA: calculation of free energies of block copolymer DSA systems via thermodynamic integration of a mesoscale block-copolymer model , 2014, Advanced Lithography.
[37] C. Grant Willson,et al. Design of high‐χ block copolymers for lithography , 2015 .
[38] P. Nealey,et al. Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates , 2003, Nature.
[39] K. Berggren,et al. Assembly of sub-10-nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing. , 2011, Nano letters.
[40] Timothy P. Lodge,et al. Diffusion in microstructured block copolymer melts , 1997 .
[41] D. Morse,et al. Universal Phenomenology of Symmetric Diblock Copolymers near the Order–Disorder Transition , 2015 .
[42] Mark P. Stoykovich,et al. Network Connectivity and Long-Range Continuity of Lamellar Morphologies in Block Copolymer Thin Films , 2012 .
[43] Lieve Van Look,et al. Defect reduction and defect stability in IMEC's 14nm half-pitch chemo-epitaxy DSA flow , 2014, Advanced Lithography.
[44] Mark P. Stoykovich,et al. Processing Approaches for the Defect Engineering of Lamellar-Forming Block Copolymers in Thin Films , 2013 .
[45] Glenn H. Fredrickson,et al. Fluctuation effects in a symmetric diblock copolymer near the order–disorder transition , 1990 .
[46] R. Ruiz,et al. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly , 2008, Science.
[47] Marcus Müller,et al. Defects in the Self-Assembly of Block Copolymers and Their Relevance for Directed Self-Assembly. , 2015, Annual review of chemical and biomolecular engineering.
[48] Juan J de Pablo,et al. Molecular pathways for defect annihilation in directed self-assembly , 2015, Proceedings of the National Academy of Sciences.
[49] G. Fredrickson,et al. Defectivity in Laterally Confined Lamella-Forming Diblock Copolymers: Thermodynamic and Kinetic Aspects , 2012 .
[50] N. Balsara,et al. Effect of Molecular Structure on the Thermodynamics of Block Copolymer Melts , 1994 .
[51] R. Segalman. Patterning with block copolymer thin films , 2005 .
[52] T. Hashimoto,et al. Small-angle neutron scattering studies on phase behavior of block copolymers , 1999 .
[53] T. Lodge,et al. Mechanisms of chain diffusion in lamellar block copolymers. , 1995, Physical review letters.