Simulation of statistical effects in exposure and development of EUV photoresists using the percolation and diffusion limited aggregation model
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[1] Paulette Clancy,et al. Metal–Organic Framework-Inspired Metal-Containing Clusters for High-Resolution Patterning , 2018, Chemistry of Materials.
[2] Andreas Frommhold,et al. Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet , 2016 .
[3] V. Manuel.,et al. Looking for a physical basis of rainfall multifractality , 2020 .
[4] L. Sander,et al. Diffusion-limited aggregation, a kinetic critical phenomenon , 1981 .
[5] Jing Jiang,et al. Metal Oxide Nanoparticle Photoresists for EUV Patterning , 2014 .