Understanding the factors affecting contact resistance in nanowire field effect transistors (NWFETs) to improve nanoscale contacts for future scaling
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H. Bender | N. Collaert | T. Ivanov | S. Ramesh | A. Sibaja-Hernandez | P. Favia | D. Lin | A. Milenin | S. El Kazzi | P. Lagrain | A. Alian | E. Camerotto | N. Pinna | K. De Meyer