The Influence of Contact Composition, Pretreatment, and Annealing Gas on the Ohmic Behavior of Ti/Al-Based Ohmic Contacts to n -Al 0.4 Ga 0.6 N
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I. Ferguson | R. Birkhahn | S. Mohney | M. Pophristic | D. Gotthold | K. O. Schweitz | T. Pribicko | T. Isaacs-smith | John R. Williams