Transparent Conducting Oxides—An Up-To-Date Overview
暂无分享,去创建一个
[1] K. Poeppelmeier,et al. DC reactive magnetron sputtering, annealing, and characterization of CuAlO2 thin films , 2011 .
[2] J. Müller,et al. Development of highly efficient thin film silicon solar cells on texture-etched zinc oxide-coated glass substrates , 2001 .
[3] H. Hosono,et al. Bipolarity in electrical conduction of transparent oxide semiconductor CuInO2 with delafossite structure , 2001 .
[4] S.J. Chang,et al. GaN metal-semiconductor-metal ultraviolet photodetectors with transparent indium-tin-oxide Schottky contacts , 2001, IEEE Photonics Technology Letters.
[5] H. Schade,et al. State-of-the-art mid-frequency sputtered ZnO films for thin-film silicon solar cells and modules , 2003 .
[6] M. Hon,et al. Growth characteristics and residual stress of RF magnetron sputtered ZnO:Al films , 2003 .
[7] S. Benchabane,et al. Ultra thin nickel transparent electrodes , 2009 .
[8] I. Sieber,et al. Free-carrier plasma resonance effects and electron transport in reactively sputtered degenerate ZnO:Al films , 1999 .
[9] R. Schropp,et al. Surface textured ZnO films for thin film solar cell applications by expanding thermal plasma CVD , 2001 .
[10] Gong Zhang,et al. Properties of transparent conductive ZnO: Al thin films prepared by magnetron sputtering , 2004, Microelectron. J..
[11] Ruben K. Hovsepyan,et al. Influence of thermal annealing on optical and electrical properties of ZnO films prepared by electron beam evaporation , 2003 .
[12] K. Okimura,et al. Effect of Annealing with Ar Plasma Irradiation for Transparent Conductive Nb-Doped TiO2 Films on Glass Substrate , 2009 .
[13] Jow-Lay Huang,et al. The properties of heavily Al-doped ZnO films before and after annealing in the different atmosphere , 2004 .
[14] Marius Grundmann,et al. Optical and electrical properties of epitaxial (Mg,Cd)xZn1−xO, ZnO, and ZnO:(Ga,Al) thin films on c-plane sapphire grown by pulsed laser deposition , 2003 .
[15] J. Doumerc,et al. Luminescent properties of delafossite-type oxides LaCuO2 and YCuO2 , 1997 .
[16] P. Löbmann,et al. Preparation of p-type conducting transparent CuCrO2 and CuAl0.5Cr0.5O2 thin films by sol–gel processing , 2009 .
[17] B. Szyszka. Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering , 1999 .
[18] T. Marks,et al. Silver delafossite oxides. , 2008, Inorganic chemistry.
[19] H. Hosono,et al. A New p-Type Conductive Oxide with Wide Band GAP, SrCu 2 O 2 , 1998 .
[20] R. Cebulla,et al. Transparent and conducting ZnO(:Al) films deposited by simultaneous RF- and DC-excitation of a magnetron , 1998 .
[21] A. Jiménez-González,et al. Optical and electrical characteristics of aluminum-doped ZnO thin films prepared by solgel technique , 1998 .
[22] Y. Natsume,et al. Zinc oxide films prepared by sol-gel spin-coating , 2000 .
[23] M. Khakani,et al. Microstructure and physical properties of nanostructured tin oxide thin films grown by means of pulsed laser deposition , 2002 .
[24] H. Ohta,et al. Epitaxial growth of transparent p-type conducting CuGaO2 thin films on sapphire (001) substrates by pulsed laser deposition , 2001 .
[25] K. Chattopadhyay,et al. Size-dependent optical properties of sputter-deposited nanocrystalline p-type transparent CuAlO2 thin films , 2005 .
[26] Z. Wang,et al. Preparation and characterization of high-performance direct current magnetron sputtered ZnO:Al films , 2005 .
[27] V. Singh,et al. Resistive switching mechanism in delafossite-transition metal oxide (CuInO2–CuO) bilayer structure , 2010 .
[28] P. Ramasamy,et al. Preparation of ternary Cd1–xZnxS alloy by photochemical deposition (PCD) and its application to photovoltaic devices , 2006 .
[29] W. Fuhs,et al. Electron microscopic characterization of reactively sputtered ZnO films with different Al-doping levels , 1998 .
[30] T. Fujitani,et al. The effect of ZnO in methanol synthesis catalysts on Cu dispersion and the specific activity , 1998 .
[31] Z. G. Liu,et al. Preparation and characterization of ZnO:Al films by pulsed laser deposition , 1997 .
[32] P. Hagenmuller,et al. On magnetic properties of some oxides with delafossite-type structure , 1986 .
[33] D. W. Readey,et al. Non-vacuum and PLD growth of next generation TCO materials , 2003 .
[34] Synthese und optische Eigenschaften von ZnO Nanokristallen , 2002 .
[35] Ian T. Ferguson,et al. Epitaxial Growth and Characterization of p-Type ZnO , 2007 .
[36] Li-Jian Meng,et al. Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature , 1998 .
[37] Xin Jiang,et al. Growth behaviours and properties of the ZnO:Al films prepared by reactive mid-frequency magnetron sputtering , 2003 .
[38] B. Mehta,et al. Effect of structural anisotropy on electronic conduction in delafossite tin doped copper indium oxide thin films , 2008 .
[39] D. B. Rogers,et al. Chemistry of noble metal oxides. I. Syntheses and properties of ABO2 delafossite compounds , 1971 .
[40] A. Zunger,et al. Cluster-doping approach for wide-gap semiconductors: the case of p-type ZnO. , 2003, Physical review letters.
[41] A. Gilliland,et al. On the band gap of CuAlO2 delafossite , 2006 .
[42] R. Schropp,et al. Property control of expanding thermal plasma deposited textured zinc oxide with focus on thin film solar cell applications , 2005 .
[43] Preparation and characterization of sprayed In2O3:Mo films , 2008 .
[44] B. Yang,et al. RF reactive sputter deposition and characterization of transparent CuAlO2 thin films , 2006 .
[45] F. Bruneval,et al. Effects of electronic and lattice polarization on the band structure of delafossite transparent conductive oxides. , 2009, Physical review letters.
[46] Andreas Stadler. Analyzing UV/Vis/NIR Spectra—Part II: Correct and Efficient Parameter Extraction , 2011, IEEE Sensors Journal.
[47] M. Uplane,et al. Structural, optical and electrical studies on spray deposited highly oriented ZnO films , 2000 .
[48] T. Marks,et al. Hydrothermal synthesis of delafossite-type oxides , 2006 .
[49] S. Jeong,et al. Structural and optical properties of silver-doped zinc oxide sputtered films , 2005 .
[50] F. Reuss. Untersuchung des Dotierverhaltens und der magnetischen Eigenschaften von epitaktischen ZnO-Heterostrukturen , 2006 .
[51] H. Kung,et al. Characterization of CuO/ZnO under oxidizing conditions for the oxidative methanol reforming reaction , 2000 .
[52] D. Dimova‐Malinovska,et al. Optical and electrical properties of R.F. magnetron sputtered ZnO:Al thin films , 1998 .
[53] Steven M. George,et al. Growth of ZnO/Al2O3 Alloy Films Using Atomic Layer Deposition Techniques , 2003 .
[54] H. Hosono,et al. Preparation of n-type conductive transparent thin films of AgInO2:Sn with delafossite-type structure by pulsed laser deposition , 2000 .
[55] Frank Nüesch,et al. A photoelectron spectroscopy study on the indium tin oxide treatment by acids and bases , 1999 .
[56] A. Draeseke,et al. Transparent p-n Heterojunction Thin Film Diodes , 2001 .
[57] H. Ohta,et al. Fabrication of all oxide transparent p-n homojunction using bipolar CuInO2 semiconducting oxide with delafossite structure , 2001 .
[58] K. Waugh,et al. Comments on “The effect of ZnO in methanol synthesis catalysts on Cu dispersion and the specific activity” [by T. Fujitani and J. Nakamura] , 1999 .
[59] M. Hon,et al. Studying of transparent conductive ZnO : Al thin films by RF reactive magnetron sputtering , 2000 .
[60] D. Milliron,et al. Surface oxidation activates indium tin oxide for hole injection , 2000 .
[61] Elvira Fortunato,et al. Al-doped ZnO thin films by sol–gel method , 2004 .
[62] Dongho Kim,et al. Refractive index of the CuAlO2 delafossite , 2008 .
[63] A. Dakhel. Influence of hydrogenation on the electrical and optical properties of CdO thin films , 2008 .
[64] A. Sleight,et al. Trends in negative thermal expansion behavior for AMO2 (A=Cu or Ag; M=Al, Sc, In, or La) compounds with the delafossite structure , 2005 .
[65] Sven Laux,et al. Room-temperature deposition of indium tin oxide thin films with plasma ion-assisted evaporation , 1998 .
[66] J. Horwitz,et al. Effect of aluminum doping on zinc oxide thin films grown by pulsed laser deposition for organic light-emitting devices , 2000 .
[67] QiaoZhi Wang,et al. Electrical and optical properties of Al-doped transparent conducting ZnO films deposited on organic substrate by RF sputtering , 2001 .
[68] Alberto Piqué,et al. Indium tin oxide thin films for organic light-emitting devices , 1999 .
[69] Zu Xiao-tao,et al. Preparation of p-type ZnO:(Al, N) by a combination of sol?gel and ion-implantation techniques , 2008 .
[70] K. Poeppelmeier,et al. Point defects and transport mechanisms in transparent conducting oxides of intermediate conductivity , 2005 .
[71] David C. Paine,et al. A study of low temperature crystallization of amorphous thin film indium–tin–oxide , 1999 .
[72] M. Jeong,et al. Properties of transparent conductive ZnO:Al films prepared by co-sputtering , 2005 .
[73] L. Dai,et al. Properties of Al heavy-doped ZnO thin films by RF magnetron sputtering , 2008 .
[74] J. Lv,et al. Optical and Wetting Properties of CuAlO2 Films Prepared by Radio Frequency Magnetron Sputtering , 2012 .
[75] Wen-How Lan,et al. Low-resistance and high-transparency Ni/indium tin oxide ohmic contacts to p-type GaN , 2001 .
[76] Hyoun Woo Kim,et al. Electrical Resistivity and Transmittance Properties of Al- and Ga-codoped ZnO Thin Films , 2010 .
[77] I. Sieber,et al. Transparent conductive ZnO:Al films by reactive co-sputtering from separate metallic Zn and Al targets , 1999 .
[78] A. Draeseke,et al. p-Type conductivity in the delafossite structure , 2001 .
[79] Tao Wang,et al. Low temperature synthesis wide optical band gap Al and (Al, Na) co-doped ZnO thin films , 2011 .
[80] Junji Nakamura,et al. The role of ZnO in Cu/ZnO methanol synthesis catalysts — morphology effect or active site model? , 2001 .
[81] Arthur J Freeman,et al. Electronic band structure of indium tin oxide and criteria for transparent conducting behavior , 2001 .
[82] S. Pearton,et al. Zinc oxide bulk, thin films and nanostructures : processing, properties and applications , 2006 .
[83] The effect of thickness on the properties of heavily Al-doped ZnO films by simultaneous rf and dc magnetron sputtering , 2004 .
[84] A. A. Dakhel,et al. Influence of dysprosium doping on the electrical and optical properties of CdO thin films , 2009 .
[85] T. Okuda,et al. Specific heat of delafossite oxide CuCr 1-x Mg x O 2 (0≤x≤0.03) , 2008 .
[86] K. Cheong,et al. Electrical and optical studies of ZnO:Ga thin films fabricated via the sol-gel technique , 2002 .
[87] E. Fortunato,et al. Influence of the doping and annealing atmosphere on zinc oxide thin films deposited by spray pyrolysis , 1999 .
[88] Junsin Yi,et al. High transmittance and low resistive ZnO:Al films for thin film solar cells , 2005 .
[89] Jin Ma,et al. Thickness dependence of structural, optical and electrical properties of ZnO:Al films prepared on flexible substrates , 2001 .
[90] M. Tsai,et al. Delafossite-CuAlO2 Thin Films Prepared by Thermal Annealing , 2011 .
[91] TCO Thin Films with Permittivity Control , 2009 .
[92] Hoi Sing Kwok,et al. OPTICAL PROPERTIES OF EPITAXIALLY GROWN ZINC OXIDE FILMS ON SAPPHIRE BY PULSED LASER DEPOSITION , 1999 .
[93] J. Myoung,et al. Effects of H2 ambient annealing in fully 0 0 2-textured ZnO:Ga thin films grown on glass substrates using RF magnetron co-sputter deposition , 2009 .
[94] T. Y. Kim,et al. Anisotropic electrical conductivity of delafossite-type CuAlO2 laminar crystal , 2001 .
[95] H. Hartnagel,et al. Semiconducting Transparent Thin Films , 1995 .
[96] Hiroshi Kawazoe,et al. Transparent Conducting Oxides Based on the Spinel Structure , 2004 .
[97] Congting Sun,et al. Formation of Al-doped ZnO films by dc magnetron reactive sputtering , 2001 .
[98] B. Wang,et al. Effect of process conditions on the optoelectronic characteristics of ZnO:Mo thin films prepared by pulsed direct current magnetron sputtering , 2010 .
[99] Z. Qiao,et al. Dielectric modeling of transmittance spectra of thin ZnO:Al films , 2006 .
[100] M. Jayaraj,et al. New CuM2/3Sb1/3O2 and AgM2/3Sb1/3O2 Compounds with the Delafossite Structure. , 2002 .
[101] S. Park,et al. Deposition of indium–tin-oxide films on polymer substrates for application in plastic-based flat panel displays , 2001 .
[102] F. A. Benko,et al. Opto-electronic properties of p- and n-type delafossite, CuFeO2 , 1987 .
[103] Zhang De-heng,et al. Optical and electronic properties of transparent conducting ZnO and ZnO:Al films prepared by evaporating method , 1999 .
[104] D. Keszler,et al. Transparent p-type conducting BaCu2S2 films , 2002 .
[105] J. M. Yang,et al. The Electronic and Optical Properties of IZO Thin Films Prepared by Pulsed DC Magnetron Sputtering , 2007 .
[106] J. Müller,et al. Upscaling of texture-etched zinc oxide substrates for silicon thin film solar cells , 2001 .
[107] Michel A. Aegerter,et al. Optical, electrical and structural properties of sol gel ZnO:Al coatings , 1999 .
[108] P. Löbmann,et al. Preparation of CuAlO2 and CuCrO2 thin films by sol―gel processing , 2009 .
[109] Takao Ishida,et al. Structures and properties of electron-beam-evaporated indium tin oxide films as studied by x-ray photoelectron spectroscopy and work-function measurements , 1993 .
[110] D. W. Readey,et al. A simple method for the preparation of transparent p-type Ca-doped CuInO2 films: Pulsed-laser deposition from air-sintered Ca-doped Cu2In2O5 targets , 2004 .
[111] A. Maldonado,et al. ZnO:Al thin films obtained by chemical spray: effect of the Al concentration , 2002 .
[112] David O. Scanlon,et al. Conductivity Limits in CuAlO2 from Screened-Hybrid Density Functional Theory , 2010 .
[113] Thomas Höche,et al. Transparent semiconducting ZnO:Al thin films prepared by spray pyrolysis , 1999 .
[114] H. Hosono,et al. SrCu2O2: A p-type conductive oxide with wide band gap , 1998 .
[115] David P. Cann,et al. Crystal chemistry and electrical properties of the delafossite structure , 2006 .
[116] Tetsuya Yamamoto,et al. Codoping for the fabrication of p-type ZnO , 2002 .
[117] Z. Jarzȩbski. Preparation and Physical Properties of Transparent Conducting Oxide Films , 1982, May 16.
[118] Hong-lei Ma,et al. Electrical and optical properties of ZnO: Al films prepared by an evaporation method , 1996 .
[119] W. Kobayashi,et al. Transport properties of the delafossite Rh oxide Cu 1 − x Ag x Rh 1 − y Mg y O 2 : Effect of Mg substitution on the resistivity and Hall coefficient , 2006 .
[120] Kazuhiko Seki,et al. Dependence of indium–tin–oxide work function on surface cleaning method as studied by ultraviolet and x-ray photoemission spectroscopies , 2000 .
[121] Hu-Jie Jin,et al. A novel phenomenon: p-Type ZnO:Al films deposited on n-Si substrate , 2009 .
[122] H. Yamauchi,et al. THERMOELECTRIC POWER OF DELAFOSSITE-DERIVED COMPOUNDS, RCUO2+DELTA (R =Y, LA, PR, ND, SM, AND EU) , 1998 .
[123] S. Zhang,et al. Bipolar doping and band-gap anomalies in delafossite transparent conductive oxides. , 2002, Physical review letters.
[124] X. W. Sun,et al. On the initial growth of indium tin oxide on glass , 1996 .
[125] Xin Jiang,et al. Transparent and conductive ZnO:Al films deposited by large area reactive magnetron sputtering , 2003 .
[126] W. P. Mulligan,et al. Search for improved transparent conducting oxides: A fundamental investigation of CdO, Cd2SnO4, and Zn2SnO4 , 2000 .
[127] Jun Ma,et al. Transparent conducting ZnO:Al films deposited on organic substrates deposited by r.f. magnetron-sputtering , 1998 .
[128] D. W. Readey,et al. Preparation and characterization of sol–gel derived copper–strontium–oxide thin films , 2008 .
[129] H. Hosono,et al. n-type electrical conduction in transparent thin films of delafossite-type AgInO2 , 1998 .
[130] K. Ellmer,et al. Electrical transport parameters of heavily-doped zinc oxide and zinc magnesium oxide single and multilayer films heteroepitaxially grown on oxide single crystals , 2006 .
[131] F. Roca,et al. P-type strontium–copper mixed oxide deposited by e-beam evaporation , 2003 .
[132] P. Tailhades,et al. Preparation of delafossite CuFeO2 thin films by rf-sputtering on conventional glass substrate , 2006 .
[133] K. Fleischer,et al. Magnesium, nitrogen codoped Cr2O3: A p-type transparent conducting oxide , 2011 .
[134] S. Mahapatra,et al. Low-Pressure Metal–Organic Chemical Vapor Deposition of Transparent and p-Type Conducting CuCrO2 Thin Films with High Conductivity† , 2003 .
[135] Tadatsugu Minami,et al. Present status of transparent conducting oxide thin-film development for Indium-Tin-Oxide (ITO) substitutes , 2008 .
[136] M. Hon,et al. The effect of deposition temperature on the properties of Al-doped zinc oxide thin films , 2001 .
[137] A. Draeseke,et al. p-Type oxides for use in transparent diodes , 2002 .
[138] Daniel Lincot,et al. Electrochemical deposition of zinc oxide films from non-aqueous solution: a new buffer/window process for thin film solar cells , 2000 .
[139] C. Privato,et al. Transport mechanisms of RF sputtered Al-doped ZnO films by H2 process gas dilution , 1999 .
[140] Jinn-Kong Sheu,et al. Effects of thermal annealing on the indium tin oxide Schottky contacts of n-GaN , 1998 .
[141] M. Jeong,et al. Post-annealing of Al-doped ZnO films in hydrogen atmosphere , 2005 .
[142] E. Blart,et al. Synthesis of light‐coloured nanoparticles of wide band gap p‐type semiconductors CuGaO2 and LaOCuS by low temperature hydro/solvothermal processes , 2010 .
[143] P. Fons,et al. ZnO transparent conducting films deposited by pulsed laser deposition for solar cell applications , 2003 .
[144] Satoshi Kobayashi,et al. Characterization of CuAlO2 Thin Films Prepared on Sapphire Substrates by Reactive Sputtering and Annealing , 2008 .
[145] Y. Igasaki,et al. Argon gas pressure dependence of the properties of transparent conducting ZnO:Al films deposited on glass substrates , 2001 .
[146] H. Hosono,et al. Electronic structure and optoelectronic properties of transparent p-type conducting CuAlO2 , 2000 .
[147] Andreas Pflug,et al. Studies on ZnO:Al thin films deposited by in-line reactive mid-frequency magnetron sputtering , 2003 .
[148] J. Bernède,et al. Investigation of low resistance transparent MoO3/Ag/MoO3 multilayer and application as anode in organic solar cells , 2010 .
[149] Byung-Ok Park,et al. Transparent conducting ZnO:Al, In and Sn thin films deposited by the sol–gel method , 2003 .
[150] M. Antonietti,et al. Ordered mesoporous Sb-, Nb-, and Ta-doped SnO2 thin films with adjustable doping levels and high electrical conductivity. , 2009, ACS nano.
[151] Shijun Jia. Polyelectrolyte assisted preparation and characterization of nanostructured ZnO thin films , 2005 .
[152] I. Novotný,et al. Preparation and properties of ZnO layers grown by various methods , 2008 .
[153] P. Tailhades,et al. Thin films preparation by rf-sputtering of copper/iron ceramic targets with Cu/Fe = 1: From nanocomposites to delafossite compounds , 2008 .
[154] P. Löbmann,et al. Influence of single layer thickness on the performance of undoped and Mg-doped CuCrO2 thin films by sol–gel processing , 2011 .
[155] R. Synowicki,et al. Spectroscopic ellipsometry characterization of indium tin oxide film microstructure and optical constants , 1998 .
[156] T. Karasawa,et al. Electrical and optical properties of indium tin oxide thin films deposited on unheated substrates by d.c. reactive sputtering , 1993 .
[157] H. Ohta,et al. Highly electrically conductive indium–tin–oxide thin films epitaxially grown on yttria-stabilized zirconia (100) by pulsed-laser deposition , 2000 .
[158] K. Chopra,et al. Transparent conductors—A status review , 1983 .
[159] T. Makino,et al. Effect of substrate surface morphology and interface microstructure in ZnO thin films formed on various substrates , 2000 .
[160] Van de Sanden,et al. An expanding thermal plasma for deposition of surface textured ZnO:Al with focus on thin film solar cell applications , 2001 .
[161] Hui-di Zhou,et al. The effect of duty cycle on the microstructure and properties of graphite-like amorphous carbon films prepared by unbalanced magnetron sputtering , 2010 .
[162] Janet Tate,et al. p-type conductivity in CuCr1−xMgxO2 films and powders , 2001 .
[163] S. H. Lim,et al. Chemical spray pyrolysis deposition and characterization of p-type CuCr1−xMgxO2 transparent oxide semiconductor thin films , 2008 .
[164] Y. J. Kim,et al. Trapped oxygen in the grain boundaries of ZnO polycrystalline thin films prepared by plasma-enhanced chemical vapor deposition , 1999 .
[165] G. Fang,et al. Fabrication and characterization of transparent conductive ZnO:Al thin films prepared by direct current magnetron sputtering with highly conductive ZnO(ZnAl2O4) ceramic target , 2003 .
[166] C. Santilli,et al. Transparent and conductive ZnO:Al thin films prepared by sol-gel dip-coating , 2004 .
[167] Tao Wang,et al. Response to the comment on “Low temperature synthesis wide optical band gap Al and (Al, Na) co-doped ZnO thin films” , 2011 .
[168] A Porch,et al. Basic materials physics of transparent conducting oxides. , 2004, Dalton transactions.
[169] H. Harima,et al. Materials design of p-type transparent conducting oxides of delafossite CuAlO2 by super-cell FLAPW method , 2003 .
[170] M. Jayaraj,et al. Transparent p-type conducting CuScO2+x films , 2000 .
[171] Deheng Zhang,et al. Preparation of transparent conducting ZnO:Al films on polymer substrates by r. f. magnetron sputtering , 2000 .
[172] S. Durrani,et al. Optical constants of zinc sulfide films determined from transmittance measurements , 2000 .
[173] M. Tsai,et al. Delafossite-CuAlO2 films prepared by annealing of amorphous Cu–Al–O films at high temperature under controlled atmosphere , 2011 .
[174] Satoshi Kobayashi,et al. Delafossite CuAlO2 films prepared by reactive sputtering using Cu and Al targets , 2003 .
[175] M. Powalla,et al. Analysis of relevant plasma parameters for ZnO:Al film deposition based on data from reactive and non-reactive DC magnetron sputtering , 2003 .
[176] B. Hsieh,et al. Work function of indium tin oxide transparent conductor measured by photoelectron spectroscopy , 1996 .
[177] David C. Look,et al. Recent Advances in ZnO Materials and Devices , 2001 .
[178] Douglas A. Keszler,et al. P-type conductivity in transparent oxides and sulfide fluorides , 2003 .
[179] T. Moriga,et al. Transparent conductive ZnO film preparation by alternating sputtering of ZnO:Al and Zn or Al targets , 1998 .
[180] Toshiyuki Sato,et al. Hydrothermal synthesis of CuAlO2 with the delafossite structure in supercritical water , 2008 .
[181] Z. Ye,et al. Fabrication of p-Type ZnO Thin Films via DC Reactive Magnetron Sputtering by Using Na as the Dopant Source , 2007 .
[182] Mingsong Wang. Comment on Low temperature synthesis wide optical band gap Al and (Al, Na) co-doped ZnO thin films , 2011 .
[183] U. Joshi,et al. Combinatorial synthesis of Li-doped NiO thin films and their transparent conducting properties , 2006 .
[184] Alberto Piqué,et al. Electrical, optical, and structural properties of indium–tin–oxide thin films for organic light-emitting devices , 1999 .
[185] Ion beam studies on reactive DC sputtered manganese doped indium tin oxide thin films , 2008 .
[186] B. Rech,et al. Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells , 1999 .
[187] M. Jayaraj,et al. New CuM2/3Sb1/3O2 and AgM2/3Sb1/3O2 compounds with the delafossite structure , 2002 .
[188] F. Ruske,et al. High power pulsed magnetron sputtering of transparent conducting oxides , 2008 .
[189] P. Tailhades,et al. Synthesis and characterization of CuFeO2+δ delafossite powders , 2006 .
[190] Hao-Chung Kuo,et al. Effects of doping concentration and annealing temperature on properties of highly-oriented Al-doped ZnO films , 2006 .
[191] M. Karppinen,et al. Synthesis of Delafossite-Derived Phases, RECuO2+d with RE = Y, La, Nd, Sm and Eu, and Observation Of Spin Gap-Like Behavior , 1997 .
[192] A. Aberle,et al. Optimisation of ZnO:Al films by change of sputter gas pressure for solar cell application , 2002 .
[193] In‐doped transparent and conducting cubic magnesium zinc oxide thin films grown by pulsed laser deposition , 2007 .
[194] Beng Kang Tay,et al. Structural, electrical and optical properties of Al-doped ZnO thin films prepared by filtered cathodic vacuum arc technique , 2004 .
[195] H. Harima,et al. Engineering of nested Fermi surface and transparent conducting p-type Delafossite CuAlO2: possible lattice instability or transparent superconductivity? , 2003 .
[196] K. Chattopadhyay,et al. Electrical characterization and Poole–Frenkel effect in sol–gel derived ZnO:Al thin films , 2005 .
[197] T. Negami,et al. Preparation of CuInS2 films by sulfurization of Cu‐In‐O films , 1993 .
[198] E. Fortunato,et al. Performances presented by zinc oxide thin films deposited by spray pyrolysis , 1999 .
[199] Zi-Qiang Xu,et al. Characteristics of Al-doped c-axis orientation ZnO thin films prepared by the sol-gel method , 2006 .
[200] H. Kavak,et al. Structural and optical properties of zinc oxide thin films prepared by spray pyrolysis method , 2006 .
[201] I. Ivanov,et al. Modification of the structure of ZnO:Al films by control of the plasma parameters , 2001 .
[202] Jow-Lay Huang,et al. Effects of substrate temperature on the properties of heavily Al-doped ZnO films by simultaneous r.f. and d.c. magnetron sputtering , 2005 .
[203] M. Jayaraj,et al. Effect of oxygen intercalation on properties of sputtered CuYO2 for potential use as p-type transparent conducting films , 2008 .
[204] H. Hosono,et al. Transparent p-type semiconductor: LaCuOS layered oxysulfide , 2000 .