Surface roughness and subsurface damage characterization of fused silica substrates
暂无分享,去创建一个
The surface microtopography and subsurface damage of fused silica have been examined after different stages of the manufacturing process. Results are presented of etching experiments and measurements performed by white light interferometry, atomic force microscopy and total light scattering.
[1] C. Ruppe,et al. Roughness analysis of optical films and substrates by atomic force microscopy , 1996 .
[2] Gunther Notni,et al. Analysis of white light interferograms using wavelet methods , 1998 .