Low-frequency noise in UHV/CVD epitaxial Si and SiGe bipolar transistors

In this work a comprehensive investigation of low-frequency noise in ultrahigh vacuum/chemical vapor deposition (UHV/CVD) Si and SiGe bipolar transistors is presented. The magnitude of the noise of SiGe transistors is found to be comparable to the Si devices for the identical profile, geometry, and bias. A comparison with different technologies demonstrates that the SiGe devices have excellent noise properties compared to AlGaAs/GaAs heterojunction bipolar transistors (HBT's) and conventional Si bipolar junction transistors (BJT's). Results from different bias configurations show that the 1/f base noise source is dominant in these devices. The combination of a 1/Area dependence on geometry and near quadratic dependence on base current indicates that the 1/f noise sources are homogeneously distributed over the entire emitter area and are probably located at the polysilicon-Si interface. Generation/recombination (Gm) noise and random telegraph signal (RTS) noise was observed in selected Si and SiGe devices. The bias dependence and temperature measurements suggest that these G/R centers are located in the base-emitter space charge region. The activation energies of the G/R traps participating in these noise processes were found to be within 250 meV of the conduction and valence band edges.

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