Careful stoichiometry monitoring and doping control during the tunneling interface growth of an n + InAs(Si)/p + GaSb(Si) Esaki diode
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B. Douhard | N. Collaert | C. Merckling | J. Alamo | A. Alian | A. Verhulst | A. Walke | P. Favia | Wenjie Lu | S. E. Kazzi | B. Hsu