论文信息 - Nickel-silicidation process using hydrogen implantation

Nickel-silicidation process using hydrogen implantation

The effect of hydrogen implantation on a nickel silicide process has been investigated. X-ray photoemission spectroscopy results show that the hydrogen implantation is effective in suppressing the oxidation of NiSi. It is further shown that the junction leakage current of the implanted samples is about one order of magnitude lower than that of the unimplanted ones.

Tae Yeon Seong | C. J. Choi | S. A. Song | Y. W. Ok

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