Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma.

An extreme-ultraviolet (EUV) radiation source near the 13-nm wavelength generated in a small (1.1 J) pinch plasma is presented. The ignition of the plasma occurs in a pseudosparklike electrode geometry, which allows for omitting a switch between the storage capacity and the electrode system and for low inductive coupling of the electrically stored energy to the plasma. Thus energies of only a few joules are sufficient to create current pulses in the range of several kiloamperes, which lead to a compression and a heating of the plasmas to electron densities of more than 10(17) cm(-3) and temperatures of several tens of electron volts, which is necessary for emission in the EUV range. As an example, the emission spectrum of an oxygen plasma in the 11-18-nm range is presented. Transitions of beryllium- and lithium-like oxygen ions can be identified. Current waveform and time-resolved measurements of the EUV emission are discussed. In initial experiments a repetitive operation at nearly 0.2 kHz could be demonstrated. Additionally, the broadband emission of a xenon plasma generated in a 2.2-J discharge is presented.

[1]  K M Skulina,et al.  Molybdenum/beryllium multilayer mirrors for normal incidence in the extreme ultraviolet. , 1995, Applied optics.

[2]  K. Frank,et al.  Pseudospark switches-technological aspects and application , 1995 .

[3]  Martin Richardson,et al.  Characterization of a Flat-Field Grazing-Incidence XUV Spectrometer , 1993 .

[4]  Gerry O'Sullivan,et al.  Spectra of Xe vii, viii, and ix in the extreme ultraviolet: 4d–mp, nf transitions , 1983 .

[5]  F. Scholze,et al.  CALIBRATION OF CHARGE COUPLED DEVICES AND A PINHOLE TRANSMISSION GRATING TO BE USED AS ELEMENTS OF A SOFT X-RAY SPECTROGRAPH , 1997 .

[6]  L. House.  Ionization Equilibrium of the Elements from H to Fe. , 1964 .

[7]  R. H. Stulen,et al.  Diffraction-limited soft-x-ray projection imaging using a laser plasma source. , 1991, Optics letters.

[8]  J. Boeuf,et al.  Pseudospark discharges via computer simulation , 1991 .

[9]  M. McGeoch,et al.  Radio-frequency-preionized xenon z-pinch source for extreme ultraviolet lithography. , 1998, Applied optics.

[10]  N. Ceglio,et al.  Wavelength considerations in soft-x-ray projection lithography. , 1993, Applied optics.

[11]  Max Toepler,et al.  Zur Kenntnis der Gesetze der Gleitfunkenbildung , 1906 .

[12]  M. Klosner,et al.  Intense xenon capillary discharge extreme-ultraviolet source in the 10-16-nm-wavelength region. , 1998, Optics letters.

[13]  S. Larigaldie.  Study of the breakdown phase in a pseudospark switch. I. Basis experiments and crude model , 1995 .

[14]  Jack Sugar,et al.  Analysis of the 4d 9 –4d 8 5p transitions in nine-times ionized xenon (Xe x) , 1983 .

[15]  M A Klosner,et al.  Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography. , 1997, Optics letters.

[16]  David L. Windt,et al.  Reduction imaging at 14 nm using multilayer‐coated optics: Printing of features smaller than 0.1 μm , 1990 .

[17]  E. A. Shamov,et al.  Multilayer coated reflective optics for Extreme UV lithography , 1995 .