Study of Charge Trap Sites in SiN Films by Hard X-ray Photoelectron Spectroscopy
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A. Ogura | J. Son | T. Koganezawa | H. Akamatsu | K. Nagata | D. Kosemura | I. Hirosawa | M. Hattori | Tatsuo Nishita | D. Katayama | M. Takei | Y. Hirota | M. Machida