论文信息 - High resolution lithography with PDMS molds

High resolution lithography with PDMS molds

The resolution, dimension stability, and reproducibility of the Soft UV-Nanoimprint is investigated. The potential for imprinting nanostructures with flexible molds in UV-curable resists in the 100nm regime are explored and the limitations analyzed. The dimensional stability of imprinted patterns is determined by the deformation of the mold that in term depends on the geometry of the structures and the imprint pressure applied.

[1] Heinz Schmid,et al. Contact-Inking Stamps for Microcontact Printing of Alkanethiols on Gold , 1999 .

[2] Heinrich Kurz,et al. Multiple imprinting in UV-based nanoimprint lithography: related material issues , 2002 .

[3] Max C. Lemme,et al. Large scale ultraviolet-based nanoimprint lithography , 2003 .

[4] Stephen Y. Chou,et al. Imprint of sub-25 nm vias and trenches in polymers , 1995 .

[5] Jan Haisma,et al. Mold‐assisted nanolithography: A process for reliable pattern replication , 1996 .

[6] H. Kurz,et al. Wafer scale patterning by soft UV-nanoimprint lithography , 2004 .

[7] C. Willson,et al. Step and flash imprint lithography: Template surface treatment and defect analysis , 2000 .

[8] Roxann L. Engelstad,et al. Prediction of fabrication distortions in step and flash imprint lithography templates , 2002 .