Fabrication of two-dimensional micro patterns for adaptive optics by using laser interference lithography

This paper presents a fabrication method of two-dimensional micro patterns for adaptive optics with a micrometric or sub-micrometric period to be used for fabrication of micro lens array or two-dimensional diffraction gratings. A multibeam two-axis Lloyd’s mirror interferometer is employed to carry out laser interference lithography for the fabrication of two-dimensional grating structures. In the proposed instrument, the optical setup consists of a light source providing a laser beam, a multi-beam generator, two plane mirrors to generate a two-dimensional XY interference pattern and a substrate on which the XY interference pattern is to be exposed. In this paper, pattern exposure tests are carried out by the developed optical configuration optimized by computer simulations. Some experimental results of the XY pattern fabrication will be reported.