Investigation of defect formation and electronic transport in microcrystalline silicon deposited by hot-wire CVD
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M. Nelhiebel | P. Schattschneider | J. Andreu | C. Voz | V. Schlosser | V. Plunger | J. Bertomeu | D. Peiró | A. Breymesser | M. Stöger | M. Ramadori