Film thickness and composition monitoring during growth by molecular beam epitaxy using alpha particle energy loss
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T. Tiedje | I. Kelson | U. Giesen | Y. Levy | M. Beaudoin | Z. Gelbart | J. Mackenzie | M. Adamcyk
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T. Tiedje | I. Kelson | U. Giesen | Y. Levy | M. Beaudoin | Z. Gelbart | J. Mackenzie | M. Adamcyk