Comparative photothermal study of reactive low-voltage ion-plated andelectron-beam-evaporated TiO(2) thin films.

The thickness-dependent optical and thermal properties and the corresponding damage thresholds have been investigated by means of various photothermal techniques on titanium dioxide thin films prepared by the conventional techniques of reactive electron-beam evaporation and reactive low-voltage ion plating (RLVIP). Compared with the reactive-electron-beam-evaporated samples, the RLVIP films exhibit a higher absorption, lower damage threshold, better thermal conductivity, lower defect density, and an almost perfect stability under Ar(+)-laser irradiation. These results are correlated with data from a multimethod approach, and a mechanism is proposed to explain the low damage threshold for the RLVIP TiO(2) films.

[1]  T H Allen,et al.  Comparison of the properties of titanium dioxide films prepared by various techniques. , 1989, Applied optics.

[2]  Albert Claude Boccara,et al.  Photothermal displacement spectroscopy: An optical probe for solids and surfaces , 1983 .

[3]  K. Bange,et al.  Stress of Tio 2 Thin Films Produced by Different Deposition Techniques , 1993 .

[4]  K Balasubramanian,et al.  Comparative study of titanium dioxide thin films produced by electron-beam evaporation and by reactive low-voltage ion plating. , 1993, Applied optics.

[5]  A. Guenther,et al.  Pulsed laser-induced damage to thin-film optical coatings - Part I: Experimental , 1981, IEEE Journal of Quantum Electronics.

[6]  Zhengxiu Fan,et al.  Applications of pulsed photothermal deflection technique in the study of laser-induced damage in optical coatings , 1991, Laser Damage.

[7]  A. Boccara,et al.  Photothermal deflection spectroscopy and detection. , 1981, Applied optics.

[8]  Zhengxiu Fan,et al.  In-situ investigation of laser conditioning of optical coatings , 1992, Laser Damage.

[9]  Eckart Matthias,et al.  Defect characterization for thin films through thermal wave detection , 1992, Laser Damage.

[10]  K. Bange,et al.  Correlation of hydrogen content with properties of oxidic thin films , 1992 .

[11]  Klaus Bange,et al.  Density, thickness and interface roughness of SiO2, TiO2 and Ta2O5 films on BK-7 glasses analyzed by x-ray reflection , 1993 .

[12]  Boon Loo,et al.  Microstructure analysis of thin films deposited by reactive evaporation and by reactive ion plating , 1989 .

[13]  C. K. Carniglia,et al.  Photothermal deflection microscopy of dielectric thin films , 1983 .

[14]  Zhouling Wu,et al.  Thermal transport studies of nanometric layer stacks by mirage detection , 1993, Laser Damage.

[15]  Robert Chow,et al.  Laser-induced damage threshold comparison of reactive low-voltage ion-plated and e-beam coatings , 1992, Laser Damage.

[16]  K Balasubramanian,et al.  Absorption and thermal conductivity of oxide thin films measured by photothermal displacement and reflectance methods. , 1993, Applied optics.

[17]  K. Guenther,et al.  Optical waveguide characterization of dielectric films deposited by reactive low-voltage ion plating. , 1993, Applied optics.

[18]  S D Jacobs,et al.  Model for laser damage dependence on thin-film morphology. , 1993, Applied optics.

[19]  J. Dobrowolski,et al.  Optical coatings deposited by reactive ion plating. , 1993, Applied optics.

[20]  Eberhard Welsch,et al.  Separation of optical thin‐film and substrate absorption by means of photothermal surface deformation technique , 1990 .

[21]  Arthur H. Guenther,et al.  The role of thermal conductivity in the pulsed laser damage sensitivity of optical thin films , 1988 .

[22]  Ernst Meyer,et al.  Surface topography of polished and oxide-coated BK-7 glasses investigated by atomic force microscopy , 1993 .

[23]  H. Windischmann,et al.  Intrinsic stress in sputtered thin films , 1991 .