Thermal stability issue of ultrathin Ti-based silicide for its application in prospective DRAM peripheral 3D FinFET transistors
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Tianchun Ye | Yaodong Liu | Jianfeng Gao | Jun Luo | Jinbiao Liu | Junfeng Li | Chao Zhao | Wenwu Wang | Dapeng Chen | Dan Zhang | Yongliang Li | Xianglie Sun | Xuebing Zhou | Jing Xu