The Optimizations of Dual-Threshold Independent-Gate FinFETs and Low-Power Circuit Designs
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[1] V. Kursun,et al. Low-Power and Compact Sequential Circuits With Independent-Gate FinFETs , 2008, IEEE Transactions on Electron Devices.
[2] Volkan Kursun,et al. FinFET technology development guidelines for higher performance, lower power, and stronger resilience to parameter variations , 2009, 2009 52nd IEEE International Midwest Symposium on Circuits and Systems.
[3] R. Sporer,et al. 14nm Ferroelectric FinFET technology with steep subthreshold slope for ultra low power applications , 2017, 2017 IEEE International Electron Devices Meeting (IEDM).
[4] Takashi Matsukawa,et al. Spatial variation of the work function in nano-crystalline TiN films measured by dual-mode scanning tunneling microscopy , 2014 .
[5] Volkan Kursun,et al. Multi-Threshold Voltage FinFET Sequential Circuits , 2011, IEEE Transactions on Very Large Scale Integration (VLSI) Systems.
[6] Kartik Mohanram,et al. Dual-$V_{th}$ Independent-Gate FinFETs for Low Power Logic Circuits , 2011, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.
[7] E. Suzuki,et al. Demonstration, analysis, and device design considerations for independent DG MOSFETs , 2005, IEEE Transactions on Electron Devices.
[8] Antonio J. Garcia-Loureiro,et al. Random Dopant, Line-Edge Roughness, and Gate Workfunction Variability in a Nano InGaAs FinFET , 2014, IEEE Transactions on Electron Devices.
[9] C. Tretz,et al. High-Density Reduced-Stack Logic Circuit Techniques Using Independent-Gate Controlled Double-Gate Devices , 2006, IEEE Transactions on Electron Devices.
[10] Pierre-Emmanuel Gaillardon,et al. Low-power multiplexer designs using three-independent-gate field effect transistors , 2017, 2017 IEEE/ACM International Symposium on Nanoscale Architectures (NANOARCH).
[11] Ali M. Niknejad,et al. Design of FinFET SRAM Cells Using a Statistical Compact Model , 2009, 2009 International Conference on Simulation of Semiconductor Processes and Devices.
[12] P. Ye,et al. First experimental demonstration of 100 nm inversion-mode InGaAs FinFET through damage-free sidewall etching , 2009, 2009 IEEE International Electron Devices Meeting (IEDM).
[13] Felipe S. Marques,et al. Exploring independent gates in FinFET-based transistor network generation , 2014, 2014 27th Symposium on Integrated Circuits and Systems Design (SBCCI).
[14] Jörgen Olsson,et al. Variable work function in MOS capacitors utilizing nitrogen-controlled TiNx gate electrodes , 2004 .
[15] Y. Suzuki,et al. Clocked CMOS calculator circuitry , 1973 .
[16] Jean-Pierre Colinge,et al. FinFETs and Other Multi-Gate Transistors , 2007 .
[17] Jianping Hu,et al. Comprehensive Optimization of Dual Threshold Independent-Gate FinFET and SRAM Cells , 2018, Active and Passive Electronic Components.
[18] Antonio J. García-Loureiro,et al. Impact of Cross-Sectional Shape on 10-nm Gate Length InGaAs FinFET Performance and Variability , 2018, IEEE Transactions on Electron Devices.
[19] Jean-Pierre Colinge,et al. MuGFET CMOS Process with Midgap Gate Material , 2007 .
[20] Rajesh A. Thakker,et al. Performance Evaluation of 14-nm FinFET-Based Ring Counter Using BSIM-CMG Model , 2018 .
[21] Kavita Khare,et al. New Leakage Reduction Techniques for FinFET Technology with Its Application , 2018, J. Circuits Syst. Comput..
[22] Niraj K. Jha,et al. FinFET Logic Circuit Optimization with Different FinFET Styles: Lower Power Possible at Higher Supply Voltage , 2014, 2014 27th International Conference on VLSI Design and 2014 13th International Conference on Embedded Systems.
[23] Kaushik Roy,et al. Modeling and Circuit Synthesis for Independently Controlled Double Gate FinFET Devices , 2007, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems.
[24] Lukas Czornomaz,et al. CMOS-Compatible Replacement Metal Gate InGaAs-OI FinFET With $I_{ON}=156~\mu \text{A}/\mu \text{m}$ at $V_{DD}= 0.5$ V and , 2016, IEEE Electron Device Letters.
[25] D. Varghese,et al. Device Design and Optimization Considerations for Bulk FinFETs , 2008, IEEE Transactions on Electron Devices.
[26] Volkan Kursun,et al. FinFET domino logic with independent gate keepers , 2009, Microelectron. J..
[27] E. Suzuki,et al. Investigation of the TiN Gate Electrode With Tunable Work Function and Its Application for FinFET Fabrication , 2006, IEEE Transactions on Nanotechnology.
[28] G. Paasch,et al. A Modified Local Density Approximation. Electron Density in Inversion Layers , 1982 .
[29] O. Faynot,et al. Multiple gate devices: advantages and challenges , 2005 .
[30] C. Hu,et al. FinFET-a self-aligned double-gate MOSFET scalable to 20 nm , 2000 .
[31] Josef Watts,et al. New Mobility Model for Accurate Modeling of Transconductance in FDSOI MOSFETs , 2018, IEEE Transactions on Electron Devices.
[32] H. Hussin,et al. Aging analysis of high performance FinFET flip-flop under Dynamic NBTI simulation configuration , 2018 .
[33] Ali M. Niknejad,et al. Compact Modeling of Variation in FinFET SRAM Cells , 2010, IEEE Design & Test of Computers.
[34] Jianping Hu,et al. Optimization of dual-threshold independent-gate FinFETs for compact low power logic circuits , 2016, 2016 IEEE 16th International Conference on Nanotechnology (IEEE-NANO).
[35] Zhiyu Liu,et al. Independent-gate and tied-gate FinFET SRAM Circuits: Design guidelines for reduced area and enhanced stability , 2007, 2007 Internatonal Conference on Microelectronics.
[36] Ali M. Niknejad,et al. BSIM—SPICE Models Enable FinFET and UTB IC Designs , 2013, IEEE Access.
[37] Rajneesh Sharma,et al. Impact of High-k Spacer on Device Performance of Nanoscale Underlap Fully Depleted SOI MOSFET , 2018, J. Circuits Syst. Comput..
[38] Weimin Zhang,et al. Physics-based compact modeling for nonclassical CMOS , 2005, ICCAD-2005. IEEE/ACM International Conference on Computer-Aided Design, 2005..