Properties of a 248-nm DUV laser mask pattern generator for the 90-nm and 65-nm technology nodes
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Johan Karlsson | Marie Jacobsson | Andrzej Karawajczyk | Hans A. Fosshaug | Mats Rosling | Johan Aman | Tobias Hedqvist | Jan Harkesjo | Peter Hogfeldt | Henrik J. Sjoberg
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