Development of fluidized bed reactors for silicon production

For an installed silicon based solar cell panel, about 40% of the energy consumed producing the cell was used during production of the silicon feedstock. Reducing the energy consumption in this step is therefore crucial in order to minimize the energy payback time of installed capacity. The most promising alternative to the conventional methods is fluidized bed reactors (FBR). The development of FBR for the production of polysilicon is here reviewed. Through the last half century several research groups and companies have contributed to the development of such reactors to a point where the method is competitive on the terms given in today's marked. Most work within the field of research has been done by the industry and this has resulted in few articles and a substantial amount of patents on the topic. This article aims to summarize the development and to paint the complete picture on what concepts have been investigated, what challenges arose and where the development stands today.

[1]  D. Kremer,et al.  A Numerical Investigation of the Effects of Gas-Phase Particle Formation on Silicon Film Deposition from Silane , 2003 .

[2]  J. Whitelaw,et al.  Convective heat and mass transfer , 1966 .

[3]  J. Couderc,et al.  Silicon deposition from silane or disilane in a fluidized bed—Part I: Experimental study , 1995 .

[4]  F. White.  Viscous Fluid Flow , 1974 .

[5]  C. M. Olson,et al.  Preparation of Hyper‐Pure Silicon , 1949 .

[6]  M. G. Norton,et al.  Microstructure and grain growth of polycrystalline silicon grown in fluidized bed reactors , 2009 .

[7]  H. de Lasa,et al.  Modeling a Silicon CVD Spouted Bed Pilot Plant Reactor , 2006 .

[8]  H. A. Becker.  The effects of shape and reynolds number on drag in the motion of a freely oriented body in an infinite fluid , 1959 .

[9]  W. Claassen,et al.  Rate-determining reactions and surface species in CVD of silicon , 1980 .

[10]  J. Korec.  Deposition of polysilicon as an example of a pyrolytic CVD process , 1980 .

[11]  E. Sparrow,et al.  Handbook of Numerical Heat Transfer , 1988 .

[12]  M. G. Norton,et al.  Grain growth and mechanical properties in bulk polycrystalline silicon , 2001 .

[13]  J. Nelson.  The physics of solar cells , 2003 .

[14]  L. Mleczko,et al.  Optimization of Reaction Conditions in a Fluidized‐Bed for Silane Pyrolysis , 2008 .

[15]  J. Bloem,et al.  シリコンのCVDにおける律速反応と表面化学種 I SiH4‐HCl‐H2系 , 1980 .

[16]  F. H. Garner,et al.  Mass transfer from a soluble solid sphere , 1958 .

[17]  Wen-ching Yang.  Handbook of Fluidization and Fluid-Particle Systems , 2003 .

[18]  T. Rodionova,et al.  The mechanism of secondary grain growth in polysilicon films , 1997 .

[19]  J. Couderc,et al.  Silicon deposition from silane or disilane in a fluidized bed—Part II: Theoretical analysis and modeling , 1995 .

[20]  B. J. Curtis,et al.  Effects of natural and forced convection in vapor phase growth systems , 1972 .

[21]  Christopher E. Dateo,et al.  Thermal Decomposition Pathways and Rates for Silane, Chlorosilane, Dichlorosilane, and Trichlorosilane , 2001 .

[22]  H. Hintzen,et al.  CVD silicon structures formed by amorphous and crystalline growth , 1983 .

[23]  G. Thodos,et al.  Mass transfer in the flow of gases through shallow fluidized beds , 1972 .

[24]  Milorad P. Dudukovic,et al.  Chemical vapor deposition and homogeneous nucleation in fluidized bed reactors: silicon from silane , 1986 .

[25]  M. Swihart,et al.  Numerical Modeling of Gas‐Phase Nucleation and Particle Growth during Chemical Vapor Deposition of Silicon , 2000 .

[26]  G. C. Hsu,et al.  Fines in Fluidized Bed Silane Pyrolysis , 1984 .

[27]  C. Takoudis,et al.  Chemical vapor deposition of silicon under reduced pressure in hot-wall reactors , 1986 .

[28]  N. Hwang.  Deposition and simultaneous etching of Si in the chemical vapor deposition (CVD) process: approach by the charged cluster model , 1999 .