Influence of LCVD technological parameters on properties of polyazomethine thin films

AbstrAct Purpose: The aim of this paper is to show influence of technological parameters (temperature and gas stream intensity) of low-temperature chemical vapour deposition (LCVD) on optical properties and morphology of polyazomethine thin films. Design/methodology/approach: Thin layers of poly (1,4-phenylene-methylenenitrilo-1,4-phenylenenitrilo-methylene) (PPI) were prepared by low temperature LCVD method with use of argon as a transport agent. The UV-Vis spectroscopy and AFM microscopy measurements on PPI thin films were performed. Findings: The LCVD parameters, like temperature and argon stream intensity, influence growth rate, morphology and optical properties of polyazomethine thin films. Optimalization of technical parameters allows for thin films with desired properties to be prepared. Research limitations/implications: Optimalization of technical LCVD parameters leads to preparing PPI thin films having desired morphology and optical properties suitable for optoelectronic applications.

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