Angular distribution measurements of sputtered atoms with characteristic X-ray emission
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[1] K. Rödelsperger,et al. Angular distribution of copper atoms sputtered with energetic ions , 1974 .
[2] P. Sigmund. A mechanism of surface micro-roughening by ion bombardment , 1973 .
[3] K. Rödelsperger,et al. Resputtering effects by measurements of angular distributions , 1973 .
[4] J. D. Garcia,et al. Inner-Shell Vacancy Production in Ion-Atom Collisions , 1973 .
[5] R. S. Nelson,et al. Surface damage and topography changes produced during sputtering , 1973 .
[6] W. O. Hofer. Anisotropic Emission in Single Crystal Sputtering Measurements on hcp Single Crystals , 1973 .
[7] A. Johansen,et al. A note on the optical properties of sputtered gold films , 1973 .
[8] H. Bay,et al. Sputtering-yield studies on silicon and silver targets , 1973 .
[9] H. Roosendaal,et al. Relation between surface structures and sputtering ratios of copper single crystals , 1971 .
[10] P. Sigmund. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets , 1969 .
[11] F. Viehböck,et al. THE ANGULAR DISTRIBUTION OF SCATTERED AND SPUTTERED 40-keV PARTICLES ON POLYCRYSTALLINE TARGETS. , 1968 .
[12] M. W. Thompson. II. The energy spectrum of ejected atoms during the high energy sputtering of gold , 1968 .
[13] J. Kistemaker,et al. Theoretical aspects of cathode sputtering in the energy range of 5–25 keV , 1960 .