IR bolometers made of polycrystalline silicon germanium
暂无分享,去创建一个
Sherif Sedky | Matty Caymax | Paolo Fiorini | Agnes Verbist | M. Caymax | P. Fiorini | S. Sedky | A. Verbist | C. Baert | Chris Baert
[1] E. F. Steigmeier,et al. Thermal and Electrical Properties of Heavily Doped Ge‐Si Alloys up to 1300°K , 1964 .
[2] T. Kamins. Polycrystalline silicon for integrated circuit applications , 1988 .
[3] Shankar B. Baliga,et al. Sputtered film thermistor IR detectors , 1994, Defense, Security, and Sensing.
[4] Robert Mertens,et al. Thin-film boron-doped polycrystalline silicon70%-germanium30% for thermopiles , 1996 .
[5] K. Liddiard. Thin-film resistance bolometer IR detectors—II , 1984 .
[6] D. W. Burns,et al. Fine-grained polysilicon films with built-in tensile strain , 1988 .
[7] D. J. Pedder,et al. Thin‐film infrared absorber structures for advanced thermal detectors , 1988 .
[8] P. Richards. Bolometers for infrared and millimeter waves , 1994 .
[9] S. Sherman,et al. Fabrication technology for an integrated surface-micromachined sensor , 1993 .