Feasibility study of III-V/Si hybrid MOS optical modulators consisting of n-InGaAsP/Al3O3/p-Si MOS capacitor formed by wafer bonding
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We investigate III-V/Si hybrid MOS optical modulators. Owing to the large electron-induced refractive index change in InGaAsP, the modulation efficiency can be improved by a few times by using n-InGaAsP/Al<sub>3</sub>O<sub>3</sub>/p-Si MOS structure. We fabricate n-InGaAsP/Al<sub>3</sub>O<sub>3</sub>/p-Si MOS capacitor, exhibiting well-behaved C-V characteristic, enabling high-performance optical modulators.
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