Exploring neutral atom microscopy

A new imaging method known as Neutral Atom Microscopy (NAM) or Scanning Helium Microscopy promises to open a unique window to the nature of surfaces at the first atomic layer. The thermal energy, non‐charged beam of atoms used allows exploring samples without the destructive effects of energetic particles or electric charges, in addition to having no topographic limitations due to the aspect ratio or shape of a solid probe tip, and with resolution potentially far better than conventional far‐field optical microscopes. Contrast mechanisms which produce surface composition information have long been known from atomic scattering experiments, such as by atomic diffraction from crystal surfaces or contrast due to surface roughness. These are now being explored in images for the first time.

[1]  F. Lorut,et al.  Ultra low-K shrinkage behavior when under electron beam in a scanning electron microscope , 2013 .

[2]  G. Bracco,et al.  Probing Surfaces with Thermal He Atoms: Scattering and Microscopy with a Soft Touch , 2013 .

[3]  E. Sánchez,et al.  Increased resolution in neutral atom microscopy , 2012, Journal of microscopy.

[4]  G. Bracco,et al.  Brightness and virtual source size of a supersonic deuterium beam , 2012 .

[5]  Gheorghe Stan,et al.  Nanoscale mapping of contact stiffness and damping by contact resonance atomic force microscopy , 2012, Nanotechnology.

[6]  E. Sánchez,et al.  A simple approach to neutral atom microscopy. , 2011, The Review of scientific instruments.

[7]  B. Borca,et al.  Helium reflectivity and Debye temperature of graphene grown epitaxially on Ru(0001) , 2011 .

[8]  A. Jardine,et al.  Helium-3 spin-echo: Principles and application to dynamics at surfaces , 2009 .

[9]  A. Jardine,et al.  Simulation and analysis of solenoidal ion sources. , 2008, The Review of scientific instruments.

[10]  M. Koch,et al.  Imaging with neutral atoms—a new matter‐wave microscope , 2008, Journal of microscopy.

[11]  G. Scoles,et al.  Supersonic molecular beam deposition of pentacene thin films on two Ag(111) surfaces with different step densities , 2005 .

[12]  M. Bohr,et al.  90 nm generation, 300 mm wafer low k ILD/Cu interconnect technology , 2003, Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695).

[13]  T. Engel A molecular beam investigation of He, CO, and O2 scattering from Pd(111) , 1978 .