Optical properties of diamond films grown by MPCVD method with alternating nanodiamond injection

Transparent polycrystalline diamond films with grain size ranging from a few tens to hundreds of nanometres were prepared on fused silica substrate by Microwave Chemical Plasma Vapour Deposition method (MPCVD). The new technique, called alternating nanodiamonds injection, was applied for substrate pretreatment. It was demonstrated that nanodiamonds injected on fused silica substrate serve as nucleation centres and make possible an increase in nucleation density to 1010 cm-2. The influence of MPCVD parameters such as methane concentration, total pressure and substrate temperature on the crystalline structure and optical properties of diamond films were investigated by using micro-Raman spectroscopy and scanning electron microscopy, transmittance and reflectance measurements in the wavelength range of 400-1000 nm. Under appropriate MPCVD parameters, diamond films with optical transmission ~70% from 650 to 1000 nm and high content of diamond phase were fabricated.

[1]  H. Makita,et al.  Ultrahigh particle density seeding with nanocrystal diamond particles , 1996 .

[2]  V. Afanas’ev,et al.  Ultradisperse diamond cluster aggregation studied by atomic force microscopy , 2000 .

[3]  B. Krauskopf,et al.  Proc of SPIE , 2003 .

[4]  H. Ehrhardt,et al.  Preparation of smooth and nanocrystalline diamond films , 1993 .

[5]  Kuei-Hsien Chen,et al.  Growth of nanocrystalline diamond films in CCl4/H2 ambient , 2005 .

[6]  Tianliang Hao,et al.  Study on enhancement of diamond nucleation on fused silica substrate by ultrasonic pretreatment , 2004 .

[7]  Kuei-Hsien Chen,et al.  Highly transparent nano-crystalline diamond films via substrate pretreatment and methane fraction optimization , 1998 .

[8]  H. Makita,et al.  Reducing the grain size for fabrication of nanocrystalline diamond films , 2001 .

[9]  V. Zhirnov,et al.  Electrophoresis of nanodiamond powder for cold cathode fabrication , 1998, Eleventh International Vacuum Microelectronics Conference. IVMC'98 (Cat. No.98TH8382).

[10]  S. Shikata.  The Road to Commercialization of Vapor-Phase-Grown Diamond , 1998 .

[11]  Glass,et al.  Analysis of the composite structures in diamond thin films by Raman spectroscopy. , 1990, Physical review. B, Condensed matter.

[12]  Qing Zhang,et al.  Optical properties of nano-crystalline diamond films deposited by MPECVD , 2003 .

[13]  S. A. Grudinkin,et al.  Nanodiamond Injection into the Gas-Phase During CVD Diamond Film Growth , 2005 .

[14]  A. Hiraki.  Low-temperature (200°C) growth of diamond on nano-seeded substrates , 2000 .

[15]  J. Robertson,et al.  Origin of the 1 1 5 0 − cm − 1 Raman mode in nanocrystalline diamond , 2001 .

[16]  D. Dandy,et al.  Studies on nucleation process in diamond CVD: an overview of recent developments , 1995 .

[17]  M. Umeno,et al.  Structural and optical properties of diamond and nano-diamond films grown by microwave plasma chemical vapor deposition , 2001 .

[18]  J. Foord,et al.  Formation of diamond and nanocrystalline diamond films by microwave plasma CVD , 2002 .

[19]  D. Guérin,et al.  Enhanced nucleation and growth of diamond thin films using a nanodiamond monolayer , 1997 .

[20]  H. Cohen,et al.  Nano-particles seeding and its characterization by X-ray photoelectron spectroscopy (XPS) , 1999 .