Fabrication method for self-aligned bottom-gate oxide thin-film transistors by utilizing backside excimer-laser irradiation through substrate
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Yoshihide Fujisaki | Taiichiro Kurita | Hiroshi Tsuji | Yoshiki Nakajima | Hiroto Sato | Tatsuya Takei | Mitsuru Nakata | T. Kurita | H. Tsuji | M. Nakata | Y. Fujisaki | Toshihiro Yamamoto | Y. Nakajima | Toshihiro Yamamoto | Hiroto Sato | T. Takei
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