论文信息 - Improved electrical and reliability performance of 65nm interconnects with new barrier integration schemes - 字舞流文

Improved electrical and reliability performance of 65nm interconnects with new barrier integration schemes

X. Federspiel | M. Grégoire | R. Bouyssou | R. Delsol | V. Girault | P. Normandon | J. Jacquemin | P. Vannier

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