Negative-bias Temperature Instability Cure by Process Optimization

Negative-bias temperature instability(NBTI)is a major challenge for modern integrated circuits manufacture. In this paper,We discuss the results of such stress on device and circuit. Performance NBTI is approached from a process point of view,providing a general picture of the manufacturing process steps that affect NBTI performance. It is found that several process steps may be optimized to reduce the NBTI suscepti-bility of p-type MOSFETs.