Study of EUV mask e-beam inspection conditions for HVM
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Shmoolik Mangan | Ran Brikman | Alex Goldenshtein | Vladislav Kudriashov | Alon Litman | Lior Shoval | Ilan Englard | Greg Hughes | C. C. Lin | C. C. Lin | S. Mangan | Vladimir Kudriashov | Ran Brikman | Lior Shoval | G. Hughes | A. Litman | I. Englard | A. Goldenshtein
[1] M. Malac,et al. Radiation damage in the TEM and SEM. , 2004, Micron.
[2] Thomas Laursen,et al. Surface modification of EUVL mask blanks by e-beam , 2011, Advanced Lithography.
[3] Takashi Yoshii,et al. A study of precision performance and scan damage of EUV masks with the LWM9000 SEM , 2007 .
[4] Shmoolik Mangan,et al. Results from a novel EUV mask inspection by 193nm DUV system , 2010, Advanced Lithography.