Aluminum nitride on silicon: Role of silicon carbide interlayer and chloride vapor-phase epitaxy technology
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S. Kukushkin | M. Shcheglov | L. Sorokin | V. Bessolov | E. Konenkova | Y. Zhilyaev | S. Sharofidinov | N. Feoktistov | L. I. Mets | A. Osipov