Plasma enhanced chemical vapour deposition of silica thin films in an integrated distributed electron cyclotron resonance reactor

[1]  B. Drévillon,et al.  Deposition of SiO2 in integrated distributed electron cyclotron resonance microwave reactor , 1997 .

[2]  Beatrys M. Lacquet,et al.  Fourier-transform design and electron cyclotron resonance plasma-enhanced deposition of lossy graded-index optical coatings. , 1996, Applied optics.

[3]  M. Hugon,et al.  Comparison of the physical and electrical properties of electron cyclotron resonance and distributed electron cyclotron resonance SiO2 , 1996 .

[4]  M. Kildemo,et al.  Real time control of plasma deposited multilayers by multiwavelength ellipsometry , 1996 .

[5]  K. Anzai,et al.  A Silicon Oxide Antireflective Layer For Optical Lithography Using Electron Cyclotron Resonance Plasma Deposition , 1996 .

[6]  J. Piqueras,et al.  Electrical properties of electron cyclotron resonance plasma-deposited silicon dioxide: effect of the oxygen to silane flow ratio , 1996 .

[7]  N. Jiang,et al.  Radio‐frequency bias effects on SiO2 films deposited by distributed electron cyclotron resonance plasma enhanced chemical vapor deposition , 1994 .

[8]  M. Wertheimer,et al.  Critical ion energy and ion flux in the growth of films by plasma‐enhanced chemical‐vapor deposition , 1994 .

[9]  J. Pelletier,et al.  Chemical vapor deposition in high-density low-pressure plasmas: reactor scale-up and performance , 1994 .

[10]  J. Piqueras,et al.  Silicon dioxide deposition by electron cyclotron resonance plasma: Kinetic and ellipsometric studies , 1994 .

[11]  Y. Taga.  Recent progress of optical thin films in the automobile industry. , 1993, Applied optics.

[12]  P. Alnot,et al.  Low Temperature Deposition of SiO2 by Distributed Electron Cyclotron Resonance Plasma‐Enhanced Chemical Vapor Deposition , 1992 .

[13]  P. R. Johansen.  Large‐area industrial vacuum coating in the 1990’s , 1990 .

[14]  L. Vallier,et al.  Distributed electron cyclotron resonance in silicon processing: Epitaxy and etching , 1990 .

[15]  J. Asmussen.  Electron cyclotron resonance microwave discharges for etching and thin‐film deposition , 1989 .

[16]  Oleg A. Popov,et al.  High density plasma sources : design, physics and performance , 1995 .

[17]  K. Seaward,et al.  Role of ions in electron cyclotron resonance plasma‐enhanced chemical vapor deposition of silicon dioxide , 1995 .

[18]  J. Pelletier.  8 – Distributed ECR Plasma Sources , 1995 .

[19]  S. Dzioba,et al.  Dielectric thin film deposition by electron cyclotron resonance plasma chemical vapor deposition for optoelectronics , 1994 .

[20]  B. Drévillon,et al.  Phase modulated ellipsometry from the ultraviolet to the infrared: In situ application to the growth of semiconductors , 1993 .